Directed self-assembly of block copolymers for next generation nanolithography

Jeong, Seong‐Jun; Kim, Ju Young; Kim, Bong Hoon; Moon, Hyoung-Seok; Kim, Sang Ouk

doi:10.1016/j.mattod.2013.11.002

Cited by 267 publications

(183 citation statements)

References 68 publications

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“…There is precedent for similar types of patterning. Weak interactions between block copolymers and chemically patterned substrates have been successfully used to create largescale low-defect periodic patterns 47 .…”

Section: Discussionmentioning

confidence: 99%

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

2014

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DNA origami has proven useful for organizing diverse nanoscale components into patterns with 6 nm resolution. However for many applications, such as nanoelectronics, large-scale organization of origami into periodic lattices is desired. Here, we report the self-assembly of DNA origami rectangles into two-dimensional lattices based on stepwise control of surface diffusion, implemented by changing the concentrations of cations on the surface. Previous studies of DNA-mica binding identified the fractional surface density of divalent cationsñ s2 ð Þ as the parameter which best explains the behaviour of linear DNA on mica. We show that for n s2 between 0.04 and 0.1, over 90% of DNA rectangles were incorporated into lattices and that, compared with other functions of cation concentration,ñ s2 best captures the behaviour of DNA rectangles. This work shows how a physical understanding of DNA-mica binding can be used to guide studies of the higher-order assembly of DNA nanostructures, towards creating large-scale arrays of nanodevices for technology.

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Section: Discussionmentioning

confidence: 99%

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

2014

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“…The types of defects that are observed in experiments encompass inter alia broken lines or spaces ("micro-bridges"), dislocations and disclinations. The integration of block copolymer lithography into microelectronic device manufacturing poses extreme demands of the areal density of defects -industry standards require that the DSA should result in less than 0.01 defect per square centimeter [17]! Thermodynamically, such a strict requirement can be fulfilled because the excess free energy ∆F d of a defect exceeds the thermal energy scale k B T by about two orders of magnitude [18].…”

Section: Introductionmentioning

confidence: 99%

Kinetics of directed self-assembly of block copolymers on chemically patterned substrates

Müller

Rey

et al. 2015

J. Phys.: Conf. Ser.

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“…The resulting polymer was precipitated in methanol. 1 H NMR (CDCl 3 , 400 MHz, δ): 1.41 (br, 2H, CH-CH 2 ), 1.84 (br, 1H, CH-CH 2 ), 6.45-6.57 (br, 2H, CH(2,5)), 7.08-7.25 (br, 3H, CH (3,4,5)). …”

Section: Preparation Of the Psmentioning

confidence: 99%

“…The directed self-assembly (DSA) of block copolymers (BCPs) has been an intensive area of research for the nanofabrication of semiconductors due to its potential in fabricating sub-10 nm feature sizes at high throughput and low cost [1]. However, to be used as a next generation lithographic mask, BCPs must possess several important properties such as strongly segregating blocks, facile perpendicular orientation control on thin films, and high etch contrasts [2].…”

Section: Introductionmentioning

confidence: 99%

Perpendicularly-Oriented Block Copolymers Containing Silicon-Rich Hyperbranched Polymers for High Resistance to O<sub>2</sub>-RIE

Seina

Odashima

Seshimo

et al. 2017

J. Photopol. Sci. Technol.

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The directed self-assembly (DSA) of block copolymers (BCPs) has recently become a viable alternative technique for the nanofabrication of semiconductors. To facilitate pattern transfer onto silicon (Si) wafers from BCP masks, a novel class of Si-rich BCPs with hyperbranched polysiloxane side chains were synthesized in this report. The resistance to oxygen-reactive ion etching (O 2 -RIE) was quantified for the linear and modifiedhyperbranched polysiloxanes, revealing that the modified-hyperbranched polysiloxanes exhibited increased O 2 -RIE resistances. Furthermore, by tailoring the chemical properties on the end-groups of the polysiloxane side chains, atomic force microscopy (AFM) and scanning electron microscopy (SEM) studies revealed that perpendicularly-oriented lamellae could be observed on the thin films.

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Directed self-assembly of block copolymers for next generation nanolithography

Cited by 267 publications

References 68 publications

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

Kinetics of directed self-assembly of block copolymers on chemically patterned substrates

Perpendicularly-Oriented Block Copolymers Containing Silicon-Rich Hyperbranched Polymers for High Resistance to O<sub>2</sub>-RIE

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