Directed self‐assembly of block copolymer‐based nanocomposites in thin films

Michman, Elisheva; Shenhar, Roy

doi:10.1002/pat.3850

Cited by 10 publications

(8 citation statements)

References 111 publications

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“…Since its inception over twenty years ago, DSA has progressed from affording highly aligned domains of stripes or dots [5][6][7][8][9][10][11] to facilitating a variety of complex and irregular morphologies [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28]. The most common DSA approaches rely on chemoepitaxial and graphoepitaxial growth of BCP domains on lithographically patterned substrates [29]. The chemoepitaxial approach utilizes twodimensional, chemically patterned substrates to orient the BCP domains [5,7,30].…”

Section: Introductionmentioning

confidence: 99%

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

2022

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The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.

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Section: Introductionmentioning

confidence: 99%

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

2022

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“…Thin films of microphase-separated BCPs have been used to create stripe or dot patterns for a number of applications [ 3 , 4 , 5 , 6 ]. Commonly, patterned BCP thin films are used as etch masks in pattern transfer steps of semiconductor materials [ 7 , 8 , 9 , 10 ], as well as to organize nanoparticles [ 11 , 12 , 13 , 14 , 15 , 16 , 17 , 18 ] or functional materials [ 19 , 20 ], for nanoporous filtration membranes [ 21 , 22 , 23 , 24 , 25 ], nanotextured surfaces [ 26 ], and biomedical devices [ 27 , 28 ].…”

Section: Introductionmentioning

confidence: 99%

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

2023

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Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control. It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by the width of the plateaus becomes a critical factor influencing the local morphology.

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“…Hybrid, well-defined nanostructures can be accomplished by combining/mixing self-assembling of amphiphilic copolymers with inorganic, semiconducting materials. Therefore, the formed hybrid materials display improved mechanical, optical, and absorptive properties and greater stability over time [19,33,34].…”

Section: Introductionmentioning

confidence: 99%

Hybrid Perovskite/Polymer Materials: Preparation and Physicochemical Properties

2021

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The aim of this work is to investigate the preparation, the optical properties, and the stability over time of a colloidal organic–inorganic hybrid perovskite (CH3NH3PbBr3)/random copolymer P(MMA-co-DMAEMA) system. Different ratios of perovskite to copolymer were used to study its effect on stability and properties. The optical properties were investigated by UV-Vis and fluorescence spectroscopy. Dynamic light scattering was used to determine the size, and the size polydispersity of the colloidal hybrid particles; while morphology was investigated by transmission electron microscopy. Photoluminescence decay studies revealed the interaction of the random copolymer with the perovskite. Finally, thin-films were prepared, to investigate the optical properties of the samples in the absence of the solvent. High temporal stability of the optical properties of thin hybrid films was observed under certain conditions.

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Directed self‐assembly of block copolymer‐based nanocomposites in thin films

Cited by 10 publications

References 111 publications

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

Hybrid Perovskite/Polymer Materials: Preparation and Physicochemical Properties

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