2018
DOI: 10.1021/acs.langmuir.8b00775
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Directed Chemical Assembly of Single and Clustered Nanoparticles with Silanized Templates

Abstract: The assembly of nanoscale materials into arbitrary, organized structures remains a major challenge in nanotechnology. Herein, we report a general method for creating 2D structures by combining top-down lithography with bottom-up chemical assembly. Under optimal conditions, the assembly of gold nanoparticles was achieved in less than 30 min. Single gold nanoparticles, from 10 to 100 nm, can be placed in predetermined patterns with high fidelity, and higher-order structures can be generated consisting of dimers … Show more

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Cited by 24 publications
(34 citation statements)
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References 59 publications
(103 reference statements)
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“…Copyright 2002, American Chemical Society. (b) Reproduced with permission . Copyright 2018, American Chemical Society.…”
Section: Plasmonic Lattices Via Colloidal Assemblymentioning
confidence: 99%
See 3 more Smart Citations
“…Copyright 2002, American Chemical Society. (b) Reproduced with permission . Copyright 2018, American Chemical Society.…”
Section: Plasmonic Lattices Via Colloidal Assemblymentioning
confidence: 99%
“…The group of Mulvaney utilized e‐beam lithography to create spaced patterns with feature sizes of 80–300 nm. These wells were postmodified by silanization with amines . The resulting attractive interactions between the amine groups and the surface of gold nanoparticles enabled assembly of plasmonic particles by simple immersion into a colloidal dispersion.…”
Section: Plasmonic Lattices Via Colloidal Assemblymentioning
confidence: 99%
See 2 more Smart Citations
“…The surfaces of the gold nanoparticles were functionalized with negatively charged bis( p ‐sulfonatophenyl) phenylphosphine (BSPP) while the surface of the silica substrate was functionalized with positive charges by salinization with aminopropytriethoxysilane. Reproduced with permission . Copyright 2018, American Chemical Society.…”
Section: Directed Assemblymentioning
confidence: 99%