Directed Assembly of Polymer Blends Using Nanopatterned Templates

Abstract

The direct assembly of polymer blends on chemically functionalized surfaces is shown to produce a variety of nonuniform complex patterns. This method provides a powerful tool for easily producing nonuniform patterns in a rapid (30 s), one‐step process with high specificity and selectivity for a variety of applications, such as nanolithography, polymeric optoelectronic devices, integrated circuits, and biosensors.

A nanoplasmonic biosensor for label-free multiplex detection of cancer biomarkers

“…For multiple label-free detection, a flow-through plasmonic biosensor chip was fabricated on hydrophilic-hydrophobic patterned glass slide via modification of a self-assembled monolayer (SAM) in two steps, using O 2 plasma to improve the target-analyte throughput in combination with a spatially resolved technique as shown in Fig 3A ( Fu et al, 2006;Wei et al, 2008;Lin et al, 2009). To assess the fabrication of plasmonic biosensor chip step (i.e., to characterize the change of hydrophobic surface to hydrophilic surface), we measured contact angles for a drop of water with the surface of the glass slides after each step ( Fig.…”

Surface phase separation, dewetting feature size, and crystal morphology in thin films of polystyrene/poly(ε-caprolactone) blend

“…Different factors such as film thickness [6,15], solvent [16,17], molecular weight [18], substrate [19][20][21], and blend composition [22][23][24] have also been examined extensively for amorphous polymer blends that involve only phase separation and dewetting process. If a crystalline polymer is introduced, unique structure may be constructed in the blend films due to the coupling of the phase separation, dewetting, and crystallization processes during spincoating.…”

Integration of Density Multiplication in the Formation of Device‐Oriented Structures by Directed Assembly of Block Copolymer–Homopolymer Blends

“…For example, there have been demonstrations of directed assembly of various morphologies, high degrees of perfection, registration, improved line edge roughness (LER) and critical dimension (CD) control, and accelerated annealing. [11,[15][16][17][18][19][20] Additionally, blockcopolymer films have been assembled into patterns with a variety of geometric complexity, [14,[21][22][23] including essential IC geometries, such as terminations, bends, jogs, junctions, and combined structures, [18,[22][23][24][25][26] required by the semiconductor design community. [24,25,27] Recent publications have also illustrated the ability of block copolymer films to provide enhanced resolution via directed assembly with density multiplication on chemical [17,28,29] and topographical patterns.…”