Direct-write 3D nanolithography at cryogenic temperatures

Bresin, Matthew; Toth, Milos; Dunn, Kathleen

doi:10.1088/0957-4484/24/3/035301

Cited by 28 publications

(51 citation statements)

References 38 publications

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“…Finally, we note that the minimum temperature that can be used to perform conventional EBID (rather than cryogenic EBID 30,31 ) is limited by adsorbate condensation onto the substrate. Condensation (i.e.…”

Section: Limitations Of the Arrhenius Analysis Methodsmentioning

confidence: 99%

“…Condensation (i.e. formation of multilayers rather than Langmuir adsorption defined by the term (1 − Θ) in Equation 1) was ignored in our analysis (however, the precursor condensation temperature is easy to find and avoid experimentally 13,30,31 ). More generally, the analysis presented here must be re-done for systems that do not exhibit Langmuir adsorption, and systems in which coverage-dependent phenomena such as adsorbate-adsorbate interactions are significant (i.e.…”

Section: Limitations Of the Arrhenius Analysis Methodsmentioning

confidence: 99%

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Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors

Cullen

Lobo

Ford

et al. 2015

ACS Appl. Mater. Interfaces

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Electron beam induced deposition (EBID) is a directwrite chemical vapor deposition technique in which an electron beam is used for precursor dissociation. Here we show that Arrhenius analysis of the deposition rates of nanostructures grown by EBID can be used to deduce the diffusion energies and the corresponding pre-exponential factors of EBID precursor molecules. We explain the limitations of this approach, define growth conditions needed to minimize errors, and explain why the errors increase systematically as EBID parameters diverge from ideal growth conditions. Under suitable deposition conditions, EBID can be used as a localized technique for the analysis of adsorption barriers and pre-factors.

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Section: Limitations Of the Arrhenius Analysis Methodsmentioning

confidence: 99%

Section: Limitations Of the Arrhenius Analysis Methodsmentioning

confidence: 99%

Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors

Cullen

Lobo

Ford

et al. 2015

ACS Appl. Mater. Interfaces

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“…The first example of direct growth of a nanopatterned material by cryogenic focused beam-induced deposition techniques was reported by Bresin et al using the (CH 3 ) 3 Pt(C p CH 3 ) precursor and electron irradiation, known as Cryo-FEBID [53,54]. The second example was reported by Córdoba et al using the W(CO) 6 precursor and ion irradiation, known as Cryo-FIBID [55].…”

Section: Focused Electron/ion Beam-induced Deposition Techniques Undementioning

confidence: 99%

“…Bresin et al have used layers of (CH3)3Pt(CpCH3) precursor condensed at −155 °C, with focused electron irradiation under 15 kV beam energy and 0.71 nA beam current [54]. As shown in Figure 3, the main result is an increase of four orders of magnitude in the growth rate by Cryo-FEBID, reaching values in the range of 10 3 C/cm 2 , similar to electron doses required for the exposure of resists in EBL with PMMA resist [2].…”

Section: Pt-c Deposits Grown By Cryo-febidmentioning

confidence: 99%

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

2019

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In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix "Cryo" is used here for cryogenic). Under cryogenic conditions, the precursor material condensates on the substrate, forming a layer that is several nm thick. Its subsequent exposure to a focused electron or ion beam and posterior heating to 50 • C reveals the deposit. Due to the extremely low charge dose required, Cryo-FEBID and Cryo-FIBID are found to excel in terms of growth rate, which is typically a few hundred/thousand times higher than room-temperature deposition. Cryo-FIBID using the W(CO) 6 precursor has demonstrated the growth of metallic deposits, with resistivity not far from the corresponding deposits grown at room temperature. This paves the way for its application in circuit edit and the fast and direct growth of micro/nano-electrical contacts with decreased ion damage. The last part of the contribution is dedicated to the comparison of these techniques with other charge-based lithography techniques in terms of the charge dose required and process complexity. The comparison indicates that Cryo-FIBID is very competitive and shows great potential for future lithography developments.

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“…In particular, selective electron beam-induced curing of the frozen organometallic layer combined with evaporation triggered via sample temperature increase can be used to make unique 3D structures with incorporated gaps. 62 Rykaczewski and Scott 63 used the cryo-FIB-SEM for in situ imaging of frost nucleation and growth on hierarchical superhydrophobic coatings. The unique advantages of performing this experiment in the cryo-FIB-SEM rather than in the typically used environmental SEM 60 are the capability of sample exposure to water vapor from various directions using a gas injection system, and imaging of ice-nanostructure interfaces revealed via FIB-milling at various frost growth stages (see Figure 3j -l).…”

Section: Cryogenic Fib-semmentioning

confidence: 99%

In situ FIB-SEM characterization and manipulation methods

2014

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IntroductionTools and their functionality often evolve through fusion of simpler instruments. Within the scope of nanotechnology, an evolution has resulted in the focused ion beam-scanning electron microscope (FIB-SEM) instrument. Gallium-based FIB systems, as we know them today, were developed in the 1980s and were quickly adopted by the semiconductor industry as a tool for analysis, repair of masks, and integrated circuit edit. 1 , 2 In the 1990s, FIB and SEM columns were combined to form the two beam platform. 3 With further integration of a variety of detectors, a nano-manipulator and a temperature-controlled stage, FIB-SEMs became multifunctional tools that provide a myriad of unique characterization, fabrication, and sample preparation capabilities. Here, we review recent developments and applications of FIB-SEMs for in situ characterization and manipulation of material at the micro-and nanoscale.In these applications, the sample may be mechanically or electrically excited, have material subtracted or added via ion milling or ion beam-induced deposition (IBID) or electron beam-induced deposition (EBID), 4 and have its temperature varied from above room temperature to cryogenic levels. Sample manipulation using nano-/microscale probes, which is often necessary to arrange the samples for their analysis or to construct a system, is a common theme across the reviewed FIB-SEM uses. 3 Mechanical, electrical, and/or thermal contacts between the nano-manipulators and the nano-/microscale objects of interest consist of localized welds made using EBID or IBID of carbon, metal, 4 electron-curable polymeric glues, 5 and, at cryogenic temperatures, ice deposition. 6 Mechanical handling can also be achieved without any deposition through use of micro-grippers 7 and, in some cases, just physical contact. 8 This article describes the current state of the art of this experimental methodology, provides case studies in the areas of mechanical, electrical, and cryogenic characterization, and provides an outlook for new opportunities for in situ characterization and manipulation using FIB-SEMs. Mechanical testingOver the past decade, there has been tremendous growth in the use of two beam instruments to advance in situ mechanical test methodologies that operate on samples with micro-or nanometer scale dimensions. Characterization of the mechanical properties of a material at this scale is important because the deformation mechanisms are strongly affected by the sample dimensions. For this, FIB-SEMs are used in many aspects of the experiments, including preparation of the micromechanical test samples from bulk material, 9 -11 transfer of the samples into the mechanical actuation device, 12 observing the sample deformation with the SEM, 13 -15 characterization of local lattice rotation during the test, 16 , 17 preparation of TEM lamellae for This article reviews recent developments and applications of two beam systems (focused ion beam [FIB] and scanning electron microscope [SEM]) for in situ characterization and manipulation ...

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Direct-write 3D nanolithography at cryogenic temperatures

Cited by 28 publications

References 38 publications

Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors

Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

In situ FIB-SEM characterization and manipulation methods

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