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2016
DOI: 10.2494/photopolymer.29.709
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Direct Self-Assembly for Non-Periodic Designs

Abstract: Previously we investigated a directed self-assembly (DSA) process for fabricating a nonperiodic pattern (i.e., wide line) lying in between the periodic line/space patterns. A symmetric poly(styrene-block-methyl methacrylate) (PS-b-PMMA) was employed here, which formed a lamella morphology with the natural period (L 0 ) of 30 nm. Unlike the conventional DSA process, we used ArF resist patterns as the chemical guides, and generated a horizontal lamella on the non-periodic guide pattern as an etch template for fa… Show more

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“…These interesting research results were presented at the Annual Conference of Photopolymer Science and Technology in 2013 and 2016, and published in the JPST [18,19].…”
Section: Hisako Aoyamamentioning
confidence: 99%
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“…These interesting research results were presented at the Annual Conference of Photopolymer Science and Technology in 2013 and 2016, and published in the JPST [18,19].…”
Section: Hisako Aoyamamentioning
confidence: 99%
“…In 2016, Dr. Yoshimoto and his coworkers have reported an application of the OK model to the new DSA process for generating the periodic and non-periodic patterns at one step [19]. In this study, they determined the values of interactive parameters between surface and block copolymers from the calibration to some experimental data.…”
Section: Hisako Aoyamamentioning
confidence: 99%