2005
DOI: 10.1021/om040118e
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Direct Reaction of Silicon with α−ω Dichloroalkanes:  Direct Formation of Dichlorosilacyclopentane

Abstract: The direct reaction of silicon with 1,4-dichlorobutane in the presence of a CuCl catalyst gives high selectivity for dichlorosilacyclopentane under some conditions. The effects of residence time, temperature, and promoters are explored, and the highest selectivity occurs at short residence time and in the presence of a Cd promoter. The reaction of silicon with methyl chloride is discussed as well. The methyl chloride reaction is usually promoted by Zn and not by Cd. The reaction of silicon with 1,3-dichloropro… Show more

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Cited by 7 publications
(1 citation statement)
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“…A few studies have provided mechanistic information on the Direct Process, which is thought to proceed through silylene intermediates that engage in SiC and SiCl bond-forming steps. , However, detailed studies of the reverse process, in which a silicide is produced by Sielement bond activations in a silane, have not been well described . This report describes a molecular model system in which the generation of Co-silicide complexes results from activations of all bonds in PhSiH 3 or SiH 4 by reaction with a Co­(I) complex, Na + (THF) 6 {[BP 3 i Pr ]­CoI} − ( 1 ), to produce dicobalt species containing unusual CoSiCo silicide cores.…”
mentioning
confidence: 99%
“…A few studies have provided mechanistic information on the Direct Process, which is thought to proceed through silylene intermediates that engage in SiC and SiCl bond-forming steps. , However, detailed studies of the reverse process, in which a silicide is produced by Sielement bond activations in a silane, have not been well described . This report describes a molecular model system in which the generation of Co-silicide complexes results from activations of all bonds in PhSiH 3 or SiH 4 by reaction with a Co­(I) complex, Na + (THF) 6 {[BP 3 i Pr ]­CoI} − ( 1 ), to produce dicobalt species containing unusual CoSiCo silicide cores.…”
mentioning
confidence: 99%