1995
DOI: 10.1016/0890-6955(94)p2391-r
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Direct printing of etch masks under computer control

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Cited by 9 publications
(6 citation statements)
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“…Gravure offset [89] microcontact printing [35,90] Hot stamping [92] Gravure printing Screen printing [87] Electrophotography [94] Inkjet printing [47,95,103,104] Masking methods Figure 2. Schematic tree structure for methods for mask generation.…”
Section: Photochemical Texturingmentioning
confidence: 99%
“…Gravure offset [89] microcontact printing [35,90] Hot stamping [92] Gravure printing Screen printing [87] Electrophotography [94] Inkjet printing [47,95,103,104] Masking methods Figure 2. Schematic tree structure for methods for mask generation.…”
Section: Photochemical Texturingmentioning
confidence: 99%
“…explained the photochemical machining with their wide applications in micro-engineering [1][2][3][4]. Cakir (2008) found that ferric chloride (FeCl 3 ) was a suitable etchant for aluminum etching.…”
Section: Introductionmentioning
confidence: 99%
“…Also the surface textures and process characteristics of the electrolytic photoetching of annealed AISI304 stainless steel in hydrochloric acid was studied [8]. Muhl et al (1995) studied direct printing of the etch masks under computer control in which all the stages of photo-processing and mask making was covered [2].…”
Section: Introductionmentioning
confidence: 99%
“…Etching process is used to make the overall manufacturing cost economical and a more environmentally friendly. (Allen & Almond 2004) studied the characterization of aqueous ferric chloride etchants used in industrial PCM [1][2][3] [9]. There are a variety of grades of FeCl 3 but this is the most commonly used etchant. )…”
Section: Introductionmentioning
confidence: 99%
“…Also the surface textures and process characteristics of the electrolytic photoetching of annealed AISI304 stainless steel in hydrochloric acid was studied [10][11][12][13]. (Muhl & George 1995) studied direct printing of etch masks under computer control in which all the stages of photo-processing and mask making [2]. (Saraf & Sadaiah 2013;Liu et al 2005) developed an artificial neural network model for the etching process [14][15][16][17][18][19].…”
Section: Introductionmentioning
confidence: 99%