2019
DOI: 10.1088/1361-6463/ab1c4b
|View full text |Cite
|
Sign up to set email alerts
|

Direct patterning of nitrogen-doped chemical vapor deposited graphene-based microstructures for charge carrier measurements employing femtosecond laser ablation

Abstract: Chemical vapor deposited nitrogen-doped graphene, transferred on SiO2/Si substrate was selectively patterned by femtosecond laser ablation for formation of the topology dedicated for charge carrier measurements. Ultrashort 1030 nm wavelength Yb:KGW fs-laser pulses of 22 µJ energy,14 mJ/cm 2 fluence, 96% pulse overlap and scanning speed of 100 mm/s were found to be optimum regime for the high throughput microstructure ablation in graphene, without surface damage of the substrate in the employed fs-laser microma… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
2
0

Year Published

2020
2020
2023
2023

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 6 publications
(3 citation statements)
references
References 37 publications
0
2
0
Order By: Relevance
“…An important distinguishing feature of the sputtering process was that samples of different thicknesses were deposited in the same deposition run, which made it possible to assign all differences between films only to the effect of thickness and to exclude variations in technological parameters from sample to sample. Graphene was grown by atmospheric pressure chemical vapor deposition (APCVD) and afterwards transferred on superconducting films by a wet room temperature process [432][433][434]. Note that the graphene deposition process was ex situ.…”
Section: Superconductor Film-graphene Sheet Hybridsmentioning
confidence: 99%
“…An important distinguishing feature of the sputtering process was that samples of different thicknesses were deposited in the same deposition run, which made it possible to assign all differences between films only to the effect of thickness and to exclude variations in technological parameters from sample to sample. Graphene was grown by atmospheric pressure chemical vapor deposition (APCVD) and afterwards transferred on superconducting films by a wet room temperature process [432][433][434]. Note that the graphene deposition process was ex situ.…”
Section: Superconductor Film-graphene Sheet Hybridsmentioning
confidence: 99%
“…Besides heating, the extreme thermodynamic conditions driven by intense laser radiation can provoke ablation processes in carbon materials [174][175][176][177]. Selective ablation provides a powerful tool for high-resolution (sub-micron scale) subtractive patterning of graphenebased layers in a rapid and versatile way [178][179][180][181][182][183][184]. Graphene-based films, even with micrometric thicknesses, can be laser-patterned for the fabrication of electrode structures that can be used in a wide variety of apparatus, such as microheaters, thermal sensors, and thermostatic devices [185].…”
Section: Treatments Based On Laser Ablationmentioning
confidence: 99%
“…For example, the femtosecond-laser irradiation of graphene films immersed in distilled water was used to prepare graphene microflower surfaces with special nanostructured edges [35]. N-doped graphene was selectively patterned for ablation to obtain topologies for charge carrier measurements [36]. However, the laser in this part of the study only served as an auxiliary processing tool following the graphene production.…”
Section: Introductionmentioning
confidence: 99%