2020
DOI: 10.1016/j.mee.2020.111313
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Direct Monte-Carlo simulation of dry e-beam etching of resist

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Cited by 4 publications
(1 citation statement)
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“…Instead of using the common approach based on the PMMA radiation scission yield, electron–electron scattering events leading to PMMA main-chain scissions were simulated with the more accurate Monte-Carlo technique using the scission probability ( ): where denotes a random number from the uniform distribution on [0, 1). The value of for room temperature (25 °C) was determined by the simulation of the experimental radiation scission yield using the approach described in our previous paper [ 24 ] and comprised 0.05.…”
Section: Simulation Of E-beam-exposed Pmma Viscosity Profilementioning
confidence: 99%
“…Instead of using the common approach based on the PMMA radiation scission yield, electron–electron scattering events leading to PMMA main-chain scissions were simulated with the more accurate Monte-Carlo technique using the scission probability ( ): where denotes a random number from the uniform distribution on [0, 1). The value of for room temperature (25 °C) was determined by the simulation of the experimental radiation scission yield using the approach described in our previous paper [ 24 ] and comprised 0.05.…”
Section: Simulation Of E-beam-exposed Pmma Viscosity Profilementioning
confidence: 99%