Direct metallic nanostructures transfer by flexible contact UV-curable nano-imprint lithography

Abstract

We propose a novel flexible contact ultraviolet (UV)-curable nano-imprint lithography process which can directly transfer metallic nanostructures by UV curing bonding force. The flexible template evaporated with metal acts as a mask, allowing only the structural region to penetrate UV light and transfer surface metallic nanostructures. By this process, aluminum metal grating of different feature sizes had been transferred to abtain single-layer or even multi-layer metallic nanostructures. The minimum width and spacing of the wire grating were 50 nm and sub-20 nm, respectively. Aluminum grating polarizer had also been fabricated and tested demonstrating the practicability of the process. © 2019 The Japan Society of Applied Physics

Broadband Vis–NIR Circular Polarizer with Cascaded Aluminum Wire‐Grid

“…The vertical thermal evaporation of the metallic aluminum has good directionality and no metal deposition on the sidewalls of the dielectric wire‐grid (Figure 5e). During the NTP process, the UV‐curable bonding force [ 52 ] between the aluminum and the photoresist was used to transfer the aluminum to the surface layer of the IPS flexible template. Figure 5f contains a cross‐sectional view of the surface aluminum wire‐grid with the following geometrical parameters: period 180 nm, wire width 120 nm, and wire height 12 nm.…”

Fabrication of a Polymer Nano Nozzle for Electrohydrodynamic Small-Molecule Solvent Inkjet Printing

“…Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometer-scale structures . Electrohydrodynamic jet (E-jet) printing, compared to other methods for fabricating nanoscale structures such as electron-beam lithography, , nanoimprint lithography, , direct laser writing, , and similar methods, − offers a mask-free, cost-effective, and digital method for mass production of functional patterns − and has been successfully employed in the field of solar cells, field-effect transistors, , flexible electronics, , and bioengineering. , In E-jet printing, functional materials in the form of ink are ejected onto the collecting substrate by electric force to obtain the desired patterns. However, a lot of functional inks employ low-viscosity, small-molecule liquids as solvents such as semiconductor materials PVDT-10 dissolved in anhydrous o -dichlorobenzene, perovskite materials CH 3 NH 3 PbI 3 dissolved in isopropyl alcohol (IPA), and silver nanoparticles dispersed in n -tetradecane .…”

Mechanism of Corrosion Selectivity of NSb2Te Thin Films in the H3PO4/HNO3 Developer for Direct Laser Writing Nanolithography

“…Nanolithography, currently the most precise processing method, is widely applied for the microelectronic and optoelectronic device manufacturing. − Nanolithography can be categorized into mask lithography (such as photolithography , and nanoimprint lithography , ) and maskless direct writing lithography (involving electron beam, focused ion beam, scanning probe, and direct laser writing) based on the utilization of templates. Among others, direct laser writing has extensive applications in the fields of sensing, data storage, and micro-electromechanical systems due to its merits of low cost, high efficiency, simple operation, etc. − Unfortunately, high resolution is difficult to be realized via direct laser writing lithography due to the restriction of the optical diffraction limit .…”