Direct metal pattern writing by VUV photodissociation

Abstract

Characterizations of InN films on Si (111) substrate grown by metal-organic chemical vapor deposition with a predeposited In layer and a two-step growth method J. Vac. Sci. Technol. A 25, 701 (2007); 10.1116/1.2740293 Intergranular interactions of low temperature atmosphere annealed Co ∕ Pd magnetic multilayersAn efficient process for direct pattern writing of thin metallic films has been developed using a 121.6 nm vacuum ultraviolet source by photodissociation of metalorganic materials. The optical reflection, crystal structure, and surface morphology of photodissociated palladium thin films were studied using a spectrophotometer, x-ray diffraction, and scanning electron microscopy. A pattern of 5 m palladium lines separated by 5 m spaces was produced on glass substrate by contact printing lithography.

Highly Conducting Patterned Pd Nanowires by Direct-Write Electron Beam Lithography

“…We have made palladium nanopatterns by the direct-write EBL method using a novel resist, a palladium alkanethiolate. Pd being an important metal catalyst, its nanopatterning has attracted considerable attention. ,,,,,– Yan and Gupta obtained 5 µm lines of Pd metal by UV-photodissociating an acetate film, while Lee et al exposed a patterned poly(methyl methacrylate) (PMMA) resist to the acetate vapor and produced Pd patterns down to 500 nm. By blending PMMA with Pd precursor, metallized polymer patterns have been obtained by both UV and EBL .…”