“…We have made palladium nanopatterns by the direct-write EBL method using a novel resist, a palladium alkanethiolate. Pd being an important metal catalyst, its nanopatterning has attracted considerable attention. ,,,,,– Yan and Gupta obtained 5 µm lines of Pd metal by UV-photodissociating an acetate film, while Lee et al exposed a patterned poly(methyl methacrylate) (PMMA) resist to the acetate vapor and produced Pd patterns down to 500 nm. By blending PMMA with Pd precursor, metallized polymer patterns have been obtained by both UV and EBL .…”