2019
DOI: 10.1038/s41467-019-10610-5
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Direct band-gap crossover in epitaxial monolayer boron nitride

Abstract: Hexagonal boron nitride is a large band-gap insulating material which complements the electronic and optical properties of graphene and the transition metal dichalcogenides. However, the intrinsic optical properties of monolayer boron nitride remain largely unexplored. In particular, the theoretically expected crossover to a direct-gap in the limit of the single monolayer is presently not confirmed experimentally. Here, in contrast to the technique of exfoliating few-layer 2D hexagonal boron nitride, we exploi… Show more

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Cited by 195 publications
(220 citation statements)
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“…The computed gap with exchange corrections reads E src g = 7.6 eV. A value of η = 30 meV has been used, in agreement with the experimental measurements [30] at 10 K. The diffuse series (D−series) is due to excitons trapped in defects forming inside the gap; the sharp series (S−series) is due to (free) excitons.…”
Section: Photoluminescence Of Hbn On Graphitementioning
confidence: 65%
See 3 more Smart Citations
“…The computed gap with exchange corrections reads E src g = 7.6 eV. A value of η = 30 meV has been used, in agreement with the experimental measurements [30] at 10 K. The diffuse series (D−series) is due to excitons trapped in defects forming inside the gap; the sharp series (S−series) is due to (free) excitons.…”
Section: Photoluminescence Of Hbn On Graphitementioning
confidence: 65%
“…with d the distance between hBN and HOPG substrate and K 0 (x) the modified Bessel function. We have verified numerically that for hBN at a distance of d = 3.5Å of the HOPG substrate (this distance corresponds to the measured step height (3.5Å) between HOPG and hBN [30,32] using AFM), the screened potential is well described by the approximation in Eq. (23), n = 1 E scr g (eV) r 0 (Å) d (Å) -1.546 eV 7.6( * ) 6.9( †) 3.5 Table 4.…”
Section: Photoluminescence Of Hbn On Graphitementioning
confidence: 65%
See 2 more Smart Citations
“…Epitaxial hBN can be grown with different thicknesses from the monolayer (MLBN) to very thick stacking. We have shown that the band gap of MLBN is direct at K in reciprocal space [40] while the fundamental band gap of bulk hBN is indirect between M and K points of the first Brillouin zone [41,42]. The high internal quantum efficiency is correlated to the strong exciton-phonon coupling with an efficient and fast phonon emission that relaxes the k-dependent selection rule traditionally preventing indirect band gap semiconductors to strongly emit light via intrinsic processes [43][44][45][46][47][48].…”
Section: The Early Daysmentioning
confidence: 96%