2002
DOI: 10.1016/s0926-3373(02)00055-3
|View full text |Cite
|
Sign up to set email alerts
|

Direct atomic scale analysis of the distribution of Cu valence states in Cu/γ-Al2O3 catalysts

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

2
14
1

Year Published

2006
2006
2019
2019

Publication Types

Select...
5
2
1

Relationship

0
8

Authors

Journals

citations
Cited by 22 publications
(17 citation statements)
references
References 37 publications
2
14
1
Order By: Relevance
“…27 The shapes of the L-transitions (2p to 3d shell) near 931 eV and 951 eV and their intensity ratio (L 3 -to-L 2 ) can be used to fingerprint the oxidation state of metallic copper and its compounds. 25 The shapes of the EELS edges agree well with those reported elsewhere 28 and, together with HAADF images [ Fig. 3(a)] and SAED patterns [ Fig.…”
Section: A Structure Of the Copper-oxide Coatingsupporting
confidence: 88%
See 1 more Smart Citation
“…27 The shapes of the L-transitions (2p to 3d shell) near 931 eV and 951 eV and their intensity ratio (L 3 -to-L 2 ) can be used to fingerprint the oxidation state of metallic copper and its compounds. 25 The shapes of the EELS edges agree well with those reported elsewhere 28 and, together with HAADF images [ Fig. 3(a)] and SAED patterns [ Fig.…”
Section: A Structure Of the Copper-oxide Coatingsupporting
confidence: 88%
“…3(b) shows Bragg spots indicative of single-crystal domains, which could be indexed to bulk copper and cuprous oxide (Cu 2 O). 25 26 EELS scans, collected simultaneously with STEM images, were used to identify chemical composition within each layer Fig. 3(c).…”
Section: A Structure Of the Copper-oxide Coatingmentioning
confidence: 99%
“…It seems that the mobility of Cu on SiO film is suppressed dramatically due to the strong reaction of Cu with SiO film [18], which results in the formation of Cu-rich silicides as shown in Cu/SiO/Si system [18]. At elevated temperature, Cu oxide can also be formed [19][20] as demonstrated in deficient γ-Al 2 O 3 substrate [21]. Both processes suppress Cu mobility in SiO film.…”
Section: Discussionmentioning
confidence: 99%
“…near 931 eV and 951 eV and their intensity ratio (L3-to-L2) can be used to fingerprint the oxidation state of copper [107]. The shapes of the EELS edges agree well with those reported elsewhere [108]; and, together with the HAADF images and SAED patterns, confirm the identities of the layers labeled in Fig.…”
Section: Properties Of Nanostructured Cuosupporting
confidence: 86%