2007
DOI: 10.1016/j.physe.2006.07.017
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Dimensional evolution of silicon nanowires synthesized by Au–Si island-catalyzed chemical vapor deposition

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Cited by 31 publications
(18 citation statements)
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“…Catalyst assisted growth of nanowires through the vapor-liquid-solid mechanism (VLS) has given the possibility to control the size and position of nanowires [14][15][16][17]. In the VLS process, the silicon impinges on the substrate in the form of a precursor gas, in our case silane.…”
Section: Introductionmentioning
confidence: 99%
“…Catalyst assisted growth of nanowires through the vapor-liquid-solid mechanism (VLS) has given the possibility to control the size and position of nanowires [14][15][16][17]. In the VLS process, the silicon impinges on the substrate in the form of a precursor gas, in our case silane.…”
Section: Introductionmentioning
confidence: 99%
“…Growth rate of SiNNs is estimated to be about 350 nm/min after 15 min of growth. This value is certainly higher than the conventional CVD (12 nm/min) [41] and RTCVD (80 nm/min) [13] assisted growth rates of SiNWs. High growth rate is primarily related to the usage of VHF plasma power that caused the absence of ion bombardment in the growth region and decomposed the SiH 4 precursor more efficiently.…”
Section: Resultsmentioning
confidence: 79%
“…The individual Si NW grown at 550°C under hydrogen ambient by RTCVD resulted in two unusual structures. The detailed growth procedures are described elsewhere [20]. The top part of the Si NW, which is the part with a regular interval from the growing Au tip, exhibited a cylindrical shape.…”
Section: Resultsmentioning
confidence: 99%