Extended Abstracts of the 1998 International Conference on Solid State Devices and Materials 1998
DOI: 10.7567/ssdm.1998.d-4-6
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Digital Etching of InP Using Tris-Dimethylaminophosphorus in Ultra-High Vacuum

Nobuyuki Otsuka1,
Jun–ichi Nishizawa2,
Yutaka Oyama3
et al.
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