1988
DOI: 10.1063/1.99581
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Diffusion suppression of photolytic fragments on laser-induced chemical vapor deposition

Abstract: Diffusion suppression of Al fragments formed in a trimethylaluminum atmosphere by an ArF excimer laser during photolytic laser-induced chemical vapor deposition is investigated. Heavier molecular weight base gas such as Ar is found to act as a diffusion buffer which suppresses the diffusion of Al radicals and atoms. Furthermore, biasing the upper electrode positive relative to the stage is also effective in suppressing photolytic fragment diffusion.

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“…Adding Ar buffer gas during Al deposition, for example, can result in diffusion suppression resulting in narrower features. 25 Gas-Phase Particle Formation…”
Section: Photochemical Deposition and Cluster Formationmentioning
confidence: 99%
“…Adding Ar buffer gas during Al deposition, for example, can result in diffusion suppression resulting in narrower features. 25 Gas-Phase Particle Formation…”
Section: Photochemical Deposition and Cluster Formationmentioning
confidence: 99%