Abstract:The present article is a review of the up-to-date state of knowledge about the oxidation of silicide in film and “bulk" forms. The oxidation of silicides is analyzed with due respect to thermodynamics but the emphasis is placed on the kinetics of the process. A distinction is made between what occurs with silicide thin films used as conductors in the electronic industry, where the silicides are always in presence of excess silicon, and in the oxidation of “bulk" silicide structural parts where this condition i… Show more
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