2012
DOI: 10.1364/ome.2.000534
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Diffusion coefficients of boron in vitreous silica at high temperatures

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Cited by 10 publications
(4 citation statements)
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“…1, showing the individual deposited cladding layers with a mean refractive index close to SiO2. In the core region, under the influence of the high temperature collapsing process, evaporations are supported by a high diffusion rate that takes place on the inner consolidated Ge/B doped layer under formation of GeO and BO2, leading to the well-known 'dip' in the preform center [10,11]. The negative refractive index change (Δn) in the center is caused by a boron excess in this region.…”
Section: Ge/b Co-doped Silica Preform and Fibermentioning
confidence: 99%
“…1, showing the individual deposited cladding layers with a mean refractive index close to SiO2. In the core region, under the influence of the high temperature collapsing process, evaporations are supported by a high diffusion rate that takes place on the inner consolidated Ge/B doped layer under formation of GeO and BO2, leading to the well-known 'dip' in the preform center [10,11]. The negative refractive index change (Δn) in the center is caused by a boron excess in this region.…”
Section: Ge/b Co-doped Silica Preform and Fibermentioning
confidence: 99%
“…Dopant diffusion has been evaluated during MCVD processing of silica preforms with various dopants [5,6,8,13]. The basic concepts developed there will be applied to the fiber drawing process.…”
Section: Thermodynamical Kinetic and Geometrical Approximationsmentioning
confidence: 99%
“…In addition to thermally induced effects of dopant depletion, there also appear kinetic limitations due to dopant diffusion. Dopant diffusion has been evaluated during MCVD processing of silica preforms with various dopants [ 5 , 6 , 8 , 13 ]. The basic concepts developed there will be applied to the fiber drawing process.…”
Section: Thermodynamical Kinetic and Geometrical Approximationsmentioning
confidence: 99%
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