Diffusion and segregation of arsenic and boron in polysilicon/silicon systems during rapid thermal annealing

Inductively coupled plasma-assisted RF magnetron sputtering deposition of boron-doped microcrystalline Si films

“…Recently, boron-doped microcrystalline silicon and microcrystalline Si-based alloys have attracted a great deal of attention due to their potential application as a window layer of microcrystalline silicon-based p-i-n junction solar cells [1][2][3][4][5][6][7]. Compared to B-doped amorphous Si, this material has a higher dark conductivity, carrier mobility, doping efficiency, optical transparency, etc., due to the presence of Si crystallites embedded in the amorphous Si or Si-based matrices [8][9][10][11][12][13][14].…”