Diffuse-interface model for nanopatterning induced by self-sustained ion-etch masking

Instabilities caused during the erosion of a surface by an ion beam can lead to the formation of self-organized patterns of nanostructures. Understanding the self-organization process requires not only the in-situ characterization of ensemble averaged properties but also probing the dynamics. This can be done with the use of coherent X-rays and analyzing the temporal correlations of the scattered intensity. Here, we show that the dynamics of a semiconductor surface nanopatterned by normal incidence ion beam sputtering are age-dependent and slow down with sputtering time. This work provides a novel insight into the erosion dynamics and opens new perspectives for the understanding of self-organization mechanisms.

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“…2(c)), indicating that the height of the nanodots increases with sputtering time, in agreement with the experimental results of Ref. 26.…”

Section: Resultssupporting

confidence: 91%

Ageing dynamics of ion bombardment induced self-organization processes

Bikondoa

Carbone

Chamard

et al. 2013

Sci Rep

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“…Le Roy et al have argued that phase separation is responsible for the formation of nanodots on GaSb [25,26]. In their view, preferential sputtering of antimony leads to segregated regions of gallium at the surface of the solid; these in turn shield the underlying gallium antimonide from the incident ions, leading to the development of cones with gallium dots at their apices.…”

Section: Introductionmentioning

confidence: 99%

“…It is unclear whether the surface really is enriched in gallium, however [1,27]. Moreover, the simulations of Le Roy and co-workers were confined to two dimensions [26], and so it is not currently known whether or not their model leads to orderly arrays of nanodots in three dimensions.…”

Section: Introductionmentioning

confidence: 99%

Theory of nanoscale pattern formation produced by oblique-incidence ion bombardment of binary compounds

2014

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The Bradley-Shipman theory explains the genesis of the highly ordered hexagonal arrays of nanodots that can result from normal-incidence ion bombardment of a binary material [R. M. Bradley and P. D. Shipman, Phys. Rev. Lett. 105, 145501 (2010)]. To facilitate experimental testing of the theory, we generalize it to oblique-incidence bombardment with two diametrically opposed beams. Using analytical methods valid in the weakly nonlinear regime and computer simulations, we demonstrate that an unusual "dots-on-ripples" topography can emerge for nonzero angles of ion incidence θ . In such a pattern, nanodots arranged in a hexagonal array sit atop a ripple topography. We find that if dots-on-ripples are supplanted by surface ripples as θ or the ion energy are varied, the transition is continuous rather than hysteretic.

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“…Ion-induced segregation explains the nanopatterning process on GaSb. 32 However, in our case, iron silicide has a negative formation enthalpy with respect to Si or Fe simple substance, 33 which implies a tendency of Si-Fe integration for a lower surface energy. Therefore, ion-induced segregation is not applicable here.…”

Section: B Pattern Decaying During Postsputtering Without Fe Incorpomentioning

confidence: 96%

Mechanism of Fe impurity motivated ion-nanopatterning of Si (100) surfaces

Zhou

2010

Phys. Rev. B

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A continuum model is developed to describe surface evolution of Si ͑100͒ during normal incidence ion sputtering with Fe incorporation. The model integrates curvature-dependent erosion ͑CDE͒, ballistic smoothing, and ion-enhanced viscous flow as the surface processes during ion sputtering without Fe. And it integrates surface stress and preferential sputtering as the effects of Fe incorporation. According to our model, in the presence of Fe, the surface stress-induced instability together with CDE overcomes ballistic smoothing, leading to dot pattern formation in morphology. In addition, preferential sputtering, cooperating with the morphological instability, accomplishes the patterning in composition. The simulations based on this model qualitatively reproduce Fe motivated ion patterning and the surface evolution of prepatterned Si ͑100͒ during postsputtering.

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Diffuse-interface model for nanopatterning induced by self-sustained ion-etch masking

Cited by 48 publications

References 19 publications

Ageing dynamics of ion bombardment induced self-organization processes

Ageing dynamics of ion bombardment induced self-organization processes

Theory of nanoscale pattern formation produced by oblique-incidence ion bombardment of binary compounds

Mechanism of Fe impurity motivated ion-nanopatterning of Si (100) surfaces

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