“…Several physical and chemical techniques have been used to deposit high-quality CCTO films, such as metal organic chemical vapour deposition (MOCVD), sol-gel method, chemical solution deposition, pulsed laser deposition (PLD) and radio frequency (RF) sputtering [3,6,9,12]. Among these techniques, RF-sputtering is the most accessible method due to several advantages: relatively cost-effective, low process temperature, easyto-control parameters, high deposition rate, uniform microstructure, scalability to large areas, homogeneity over large areas, reproducibility and very good stability [21,22].…”