2019
DOI: 10.1016/j.ceramint.2019.01.077
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Dielectric and energy storage behavior of CaCu3Ti4O12 nanoparticles for capacitor application

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Cited by 36 publications
(9 citation statements)
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“…This unipolar D-E loop is used to calculate the charging energy density, discharging energy density (U D ) and efficiency (η). 3 The adopted method and other useful informations are given in the Supporting information S3. 3 vol% loaded PVDF-BST trilayered nanocomposite has the highest maximum polarization (P max ) $1.30 μC/cm 2 .…”
Section: Resultsmentioning
confidence: 99%
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“…This unipolar D-E loop is used to calculate the charging energy density, discharging energy density (U D ) and efficiency (η). 3 The adopted method and other useful informations are given in the Supporting information S3. 3 vol% loaded PVDF-BST trilayered nanocomposite has the highest maximum polarization (P max ) $1.30 μC/cm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…The structured thin film that could be deposited over a large volume will miniaturize the electronic and serve the purpose in a better way. Fundamentally, the electrostatic energy density of a linear dielectric material is given as 3 :…”
Section: Introductionmentioning
confidence: 99%
“…Over the last two decades, great effort has been put into unravelling the origins of the colossal dielectric constant of CCTO in the form of bulk and crystalline thin films [6][7][8][9][10][11][12][13]. Previously intrinsic mechanisms related to the crystal structure have been studied as a potential cause of CCTO giant permittivity.…”
Section: Introductionmentioning
confidence: 99%
“…Several physical and chemical techniques have been used to deposit high-quality CCTO films, such as metal organic chemical vapour deposition (MOCVD), sol-gel method, chemical solution deposition, pulsed laser deposition (PLD) and radio frequency (RF) sputtering [3,6,9,12]. Among these techniques, RF-sputtering is the most accessible method due to several advantages: relatively cost-effective, low process temperature, easyto-control parameters, high deposition rate, uniform microstructure, scalability to large areas, homogeneity over large areas, reproducibility and very good stability [21,22].…”
Section: Introductionmentioning
confidence: 99%
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