“…In that case, each spectral band corresponds to a specific thin film stack. This can be achieved by sequentially depositing the complete filters through a photolithographic mask and perform a liftoff of the photoresist in order to eliminate the filter on the undesired regions and obtain pixels of filters [6]. While this approach is very promising, it shows severe limitations as soon as one wants to improve the filter performances since it rapidly increases the filters thicknesses, with respect to the pixel size.…”