2000
DOI: 10.1016/s0925-9635(99)00335-0
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Diamond synthesis with a DC plasma jet: control of the substrate temperature

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Cited by 8 publications
(6 citation statements)
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“…According to this, the longer distance will lower the plasma jet temperature and velocity. Other authors [14,20,26] also found that the growth rate of the coatings decreases by decreasing the substrate temperature.…”
Section: Discussionmentioning
confidence: 79%
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“…According to this, the longer distance will lower the plasma jet temperature and velocity. Other authors [14,20,26] also found that the growth rate of the coatings decreases by decreasing the substrate temperature.…”
Section: Discussionmentioning
confidence: 79%
“…Zhou et al [25] presumed that C 2 H x is helpful to the growth of (1 1 1) crystalline surface, while CH y to that of non (1 1 1) surface. Breiter et al [26] observed that the grain size and deposition rate increase with the substrate temperature. Huang et al [19] found that the increase of the argon-to-hydrogen ratio stipulated the same effect.…”
Section: Introductionmentioning
confidence: 99%
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“…A NEA means that the vacuum level shifts beneath of conduction band minimum and therefore the electrons injected in the conduction band are emitted directly into the vacuum, enhancing the photoemission. The technology of diamond films is today based on chemical vapour deposition (CVD) methods [15][16][17][18][19], which work at high substrate temperatures (> 600 • C). In the last years, new techniques have been developed, to overcome the limit of the high deposition temperature and to allow different possibilities in terms of materials used as carbon sources.…”
Section: Introductionmentioning
confidence: 99%
“…Microwave assisted plasma CVD or DC plasma jet systems [3], and hot filament CVD [4] allow diamond layers to be synthesized with high growth rates.…”
Section: Introductionmentioning
confidence: 99%