Diamond synthesis by thermal-plasma CVD (chemical vapor deposition)

Matsumoto, Shinya; Hosoya, Ikuo; Manabe, Yuji; Hibion, Yukinobu

doi:10.1351/pac199264050751

Cited by 14 publications

(2 citation statements)

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“…A number of methods for diamond film growth have been developed, but the main difference between them is how the gas-phase carbon-containing precursor molecules are activated. The new methodologies comprise d.c. plasma, 32,33 radio frequency (RF) plasma, 34,35 d.c. plasma jet, 36,37 microwave plasma jet, 38 electron cyclotron resonance (ECR) microwave plasma, 39,40 and combustion (oxyacetylene or plasma torches) flame synthesis. [41][42][43][44][45][46] Microwave (MW) plasma and hot filament (HF) CVD growth rates are typically between 0.1 and 10 mm h 21 , while values in the range 50-1000 mm h 21 can be achieved by arc-jet and combustion flame synthesis.…”

Section: The Chemical Vapor Deposition Processmentioning

confidence: 99%

Synthesis of diamond

Ferro

2002

J. Mater. Chem.

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Diamond is impressive because of its wide range of extreme properties. By most measures, diamond is 'the biggest and best': it is the hardest known material, has the lowest coefficient of thermal expansion, is chemically inert and wear resistant, offers low friction, has high thermal conductivity, and is electrically insulating and optically transparent from the ultraviolet to the far infrared. Diamond already finds use in many different applications including, of course, its use as a precious gem, but also as a heat sink, as an abrasive, and as inserts and/or wear-resistant coatings for cutting tools. Obviously, it is possible to envisage many other potential applications for diamond as an engineering material, but progress in implementing many such ideas has been hampered by the comparative scarcity of natural diamond. This paper reports on the progress of the long running quest for ways to synthesize diamond in the laboratory

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Section: The Chemical Vapor Deposition Processmentioning

confidence: 99%

Synthesis of diamond

Ferro

2002

J. Mater. Chem.

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“…They implied that an enhancement in gas phase dissociation near ~e substrate was the cause for the increased deposition rate. [61] Conversely, negative-biasing of the substrate has been used in low pressure, microwave reactors to enhance and control the nucleation of CVD diamond. [62,63] We have conducted preliminary experiments to addresses the secondary discharge method as a means of augmenting the deposition rate while maintaining a high degree of film quality.…”

Section: Discharge Induced Nonequilibrium Plasma Chemistrymentioning

confidence: 99%

Nonequilibrium in Thermal Plasmas with Applications to Diamond Synthesis

et al. 1997

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-Atmospheric pressure plasmas are frequently considered to be in local thermodynamic equilibrium due to the high frequency of collisional processes which drive the plasma state towards a Maxwell-Boltzmann equilibrium. However, various forms of thermodynamic, ionizational, and chemical nonequilibrium have been demonstrated and investigated in atmospheric pressure plasma environments over the last several years, and the nonequilibrium behavior of such systems can be quite significant. The investigation, understanding, and exploitation of atmospheric pressure nonequilibrium plasma chemistry is necessary to the further expansion of plasma-based systems into mainstream manufacturing and processing applications. Several experimental programs to investigate the fundamental processes of atmospheric pressure nonequilibrium plasma chemistry, and the application of this nonequilibrium to various chemical systems have been undertaken in our laboratories. The results of these investigations have shed light on the kinetics behind various forms of atmospheric pressure nonequilibrium chemistry, and provided insights into the beneficial control of nonequilibrium plasma chemistry for processing applications.

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Growth of CVD Diamond for Electronic Applications

Plano

1995

Diamond: Electronic Properties and Applications

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Diamond synthesis by thermal-plasma CVD (chemical vapor deposition)

Abstract: Abstract

Cited by 14 publications

References 0 publications

Synthesis of diamond

Synthesis of diamond

Nonequilibrium in Thermal Plasmas with Applications to Diamond Synthesis

Growth of CVD Diamond for Electronic Applications

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