Diagnostics of downstream microwave electron cyclotron resonance (ECR) plasma

Kar, Rajib; Singh, Shyam; Tiwari, Neelam; Barve, D.N.; Barve, S.A.; Chand, Naresh; Patil, D.S.

doi:10.1088/1742-6596/208/1/012137

Cited by 2 publications

(2 citation statements)

References 14 publications

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“…Collecting probes are called Langmuir probes and they are routinely used for diagnostics of plasmas. The collecting-type probes are quite versatile and can give information regarding floating potential, plasma potential, electron number density, electron temperature and electron energy distribution function in the plasma [2,3]. However, electron-emitting probes, called emissive probes, are mostly used for obtaining the plasma potential values [4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

A possible explanation of the anomalous emissive probe behavior in a reactive RF plasma

Kar¹,

Barve²,

Chopade³

et al. 2012

Plasma Sources Sci. Technol.

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Emissive probe diagnostics in saturated floating potential mode was carried out in RF plasmas of argon (Ar)-methane (CH 4 ) and Ar-CH 4 -hexa methyl disiloxane (HMDSO). These plasmas are used for the deposition of diamond-like carbon (DLC) and SiO x -containing DLC films, respectively. While performing the experiments it was found that the probe characteristics had two saturation regions instead of one. The same measurements when repeated in Ar and Ar-N 2 plasmas showed a single saturation as expected. The first experiments when repeated again showed the same anomaly. The experimental findings question the validity of emissive probe diagnostics in reactive plasmas. A possible model of dust formation inside the reactive plasma is predicted and the first saturation is linked to dust. The second saturation is credited as the actual plasma potential. The concept of dust was invoked after being sure that no effects of RF and reference electrode contamination are responsible for this behavior. The results indicate that we should remain cautious when using emissive probes in reactive plasmas as they may occasionally lead to erroneous results.

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Section: Introductionmentioning

confidence: 99%

A possible explanation of the anomalous emissive probe behavior in a reactive RF plasma

Kar¹,

Barve²,

Chopade³

et al. 2012

Plasma Sources Sci. Technol.

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show abstract

“…Figure 1 shows the schematic of the ECR plasma processing facility used in the synthesis of CNWs. Details of this facility are given elsewhere [19,20]. In brief, a magnetron generates 2.45 GHz microwave, which passes through a three-port circulator connected to water cooled dummy load for taking care of reflected power.…”

Section: Introductionmentioning

confidence: 99%

Bias-independent growth of carbon nanowalls by microwave electron-cyclotron resonance plasma CVD

Kar

Patel

Chopade

et al. 2012

Journal of Experimental Nanoscience

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The investigations reported here describe the synthesis of carbon nanowalls (CNWs) by microwave electron-cyclotron resonance (ECR) plasma-assisted chemical vapour deposition (PACVD) process without an application of external bias to the substrate during growth. CNWs were grown on silicon (Si) substrates using hydrogen (H 2 )/methane (CH 4 ) plasma at 650 C substrate temperature. Nickel (Ni) was used as a catalyst for the synthesis of CNWs. To the best of our knowledge, this is the first report that describes the bias-independent growth of CNWs using the ECR PACVD process. Formation of CNWs is confirmed by scanning electron microscopy and Raman spectroscopy. The discussion part also includes a possible growth mechanism for CNWs in terms of the role of surface plasmons.

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Diagnostics of downstream microwave electron cyclotron resonance (ECR) plasma

Cited by 2 publications

References 14 publications

A possible explanation of the anomalous emissive probe behavior in a reactive RF plasma

A possible explanation of the anomalous emissive probe behavior in a reactive RF plasma

Bias-independent growth of carbon nanowalls by microwave electron-cyclotron resonance plasma CVD

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