2020
DOI: 10.1007/s10971-020-05272-5
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Di-urea cross-linked siloxane hybrid materials incorporating oligo(oxypropylene) and oligo(oxyethylene) chains

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Cited by 3 publications
(4 citation statements)
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“…Other materials such as siloxane-polyether OIH materials, also known as di- or tri-ureasil, have also been widely reported [ 11 , 14 , 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 , 24 , 25 , 26 ] for an extensive range of applications. The most common strategy to prepare such materials with the sol-gel method involves several hydrolysis and polycondensation reactions allowing their morphology, structure, and chemical composition to be tuned.…”
Section: Introductionmentioning
confidence: 99%
“…Other materials such as siloxane-polyether OIH materials, also known as di- or tri-ureasil, have also been widely reported [ 11 , 14 , 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 , 24 , 25 , 26 ] for an extensive range of applications. The most common strategy to prepare such materials with the sol-gel method involves several hydrolysis and polycondensation reactions allowing their morphology, structure, and chemical composition to be tuned.…”
Section: Introductionmentioning
confidence: 99%
“…The sol–gel process appeared a logical solution, since prior to the sol–gel transition, a reacting sol exhibits liquidlike viscosity. On account of a recent report, d-U(2000), a hybrid material belonging to the di-ureasil class, was chosen.…”
Section: Resultsmentioning
confidence: 99%
“…A set of two different polysiloxane resins has been employed here for this purpose: poly­(dimethylsiloxane) (PDMS), to yield the negative replica, and poly­(methylphenylsiloxane) (PMPS), to obtain the positive replica. To improve the fidelity of the leaflet imprinting, we decided to employ the sol–gel process. , Based on the fact that sol–gel-derived di-urea cross-linked short-chain poly­(oxyethylene) (POE)/siloxane hybrid di-ureasil , films are promising candidates as mold materials for micropatterning applications, a di-ureasil film has been employed to produce a negative replica.…”
Section: Introductionmentioning
confidence: 99%
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