2000
DOI: 10.1109/66.857944
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Device dependent control of chemical-mechanical polishing of dielectric films

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Cited by 29 publications
(17 citation statements)
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“…Normally, the calculation of weights of the feedforward model at th run is obtained by iteratively (run-to-run) minimizing the estimation error function as (3) where is the estimate error evaluated at at th run and is a vector with elements , and . Using the first order Taylor expansion of around the initial values , we obtain (4) for a small , where is the Jacobian matrix . Thus can be represented as where…”
Section: B Neural Network Trainingmentioning
confidence: 99%
See 2 more Smart Citations
“…Normally, the calculation of weights of the feedforward model at th run is obtained by iteratively (run-to-run) minimizing the estimation error function as (3) where is the estimate error evaluated at at th run and is a vector with elements , and . Using the first order Taylor expansion of around the initial values , we obtain (4) for a small , where is the Jacobian matrix . Thus can be represented as where…”
Section: B Neural Network Trainingmentioning
confidence: 99%
“…We randomly pick up 16 runs of data among the 32 DOE data sets as the training data set. Specifically we pick runs 1,2,4,6,8,10,13,15,16,17,18,21,23,25, 26, and 28. By trying different neural network structures, we finally used one hidden layer neural network with 12 hidden neurons for the feedforward neural network process model, i.e.,…”
Section: B Performance Of the Neural Network Process Modelmentioning
confidence: 99%
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“…[1]. Patel et al suggest the volume of the wafer surface step as Sheet Film Equivalent (SFE) be used to express the product-by-product polishing characteristics relating to polishing volume.…”
Section: Introductionmentioning
confidence: 98%
“…Many research has been focused on tool-induced variation, 1,4,5,8 and the product-induced variation has also been addressed recently. 6,9 In this work, we focus on two published removal rate models, namely CMP model based on topography factor 10 (simplified as TopFac model) and CMP model based on sheet film equivalent 6 (simplified as SFE model), and their application in CMP control. In Section 2, a brief review of these two models is given, and the equivalency between them is derived; In Section 3, a new control method is proposed based on the sheet film equivalent model.…”
Section: Introductionmentioning
confidence: 99%