Developments in realistic design for aperiodic Mo/Si multilayer mirrors

Aquila, Andrew; Salmassi, Farhad; Dollar, F.; Liu, Y.; Gullikson, Eric M.

doi:10.1364/oe.14.010073

Cited by 68 publications

(31 citation statements)

References 9 publications

(9 reference statements)

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“…A standard periodic multilayer would only have a bandpass of a few eV. To obtain larger bandpass we used an aperiodic multilayer design2526 based on the algorithm published in ref. 27.…”

Section: Methodsmentioning

confidence: 99%

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Dell’Angela

Hieke

Malvestuto

et al. 2016

Sci Rep

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In the past few years, we have been witnessing an increased interest for studying materials properties under non-equilibrium conditions. Several well established spectroscopies for experiments in the energy domain have been successfully adapted to the time domain with sub-picosecond time resolution. Here we show the realization of high resolution resonant inelastic X-ray scattering (RIXS) with a stable ultrashort X-ray source such as an externally seeded free electron laser (FEL). We have designed and constructed a RIXS experimental endstation that allowed us to successfully measure the d-d excitations in KCoF3 single crystals at the cobalt M2,3-edge at FERMI FEL (Elettra-Sincrotrone Trieste, Italy). The FEL-RIXS spectra show an excellent agreement with the ones obtained from the same samples at the MERIXS endstation of the MERLIN beamline at the Advanced Light Source storage ring (Berkeley, USA). We established experimental protocols for performing time resolved RIXS experiments at a FEL source to avoid X ray-induced sample damage, while retaining comparable acquisition time to the synchrotron based measurements. Finally, we measured and modelled the influence of the FEL mixed electromagnetic modes, also present in externally seeded FELs, and the beam transport with ~120 meV experimental resolution achieved in the presented RIXS setup.

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“…A standard periodic multilayer would only have a bandpass of a few eV. To obtain larger bandpass we used an aperiodic multilayer design2526 based on the algorithm published in ref. 27.…”

Section: Methodsmentioning

confidence: 99%

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Dell’Angela

Hieke

Malvestuto

et al. 2016

Sci Rep

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“…This scheme has been extensively applied in the soft x-ray and EUV region to increase both the angular and wavelength bands. [32][33][34][35][36][37][38] Note that the increase of the reflection bandwidth is unavoidably connected to a decrease of the maximum reflectivity, due to the fact that the layer thicknesses do no longer perfectly match the interference conditions. Furthermore, the absorption in the layers can be enhanced for different wavelengths/angles.…”

Section: B Broadband Multilayer Mirrormentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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“…This first attempt, to realize an aperiodic mirror with Ni/SiC multilayer, shows that the simple Ni 5 Si 2 /SiC model is not sufficient. Aquila et al demonstrated the need to include interdiffusion in the development and optimization of aperiodic Mo/Si multilayer structures in the EUV [5]. The need for high precision on each layer thickness in such a coating would require probably an even more complex model to take into account the variations of interdiffusion effects between Ni and SiC as a function of layer thickness.…”

Section: Aperiodic Ni/sic Multilayermentioning

confidence: 99%

“…The emergence of new sources and applications in the EUV and X-ray spectral domains raises more stringent requirements on the quality of multilayer mirrors. There is a real need for multilayers with low roughness and well-controlled interfaces for the design of complex components, such as ultra-short-period multilayers [1][2][3], alternate multilayer gratings [4], EUV broadband mirrors [5] and phase controlled mirrors for attosecond pulses [6], aperiodic broadband mirrors for X-ray optics [7,8] or plasma diagnostics [9,10]. It is well known that interface defects and material chemical stability often limit the theoretical efficiency of such mirrors.…”

Section: Introductionmentioning

confidence: 99%

X-ray broadband Ni/SiC multilayers: improvement with W barrier layers

Emprin¹,

Troussel²,

Soullié³

et al. 2014

Opt. Express

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We present an experimental study and performance improvement of periodic and aperiodic Ni/SiC multilayer coatings. Periodic Ni/SiC multilayer mirrors have been coated and characterized by grazing incidence X-ray reflectometry at 8.048 keV (Cu Kα radiation) and by measurements at 3 keV and 5 keV on synchrotron radiation facilities. An interdiffusion effect is found between Ni and SiC layers. A two-material model, Ni(x)Si(y)/SiC, using a silicide instead of Ni, was used to fit the measurements. The addition of 0.6 nm W barrier layers at the interfaces allows a significant reduction of the interdiffusion between Ni and SiC. In order to obtain a specific reflectivity profile in the 2 - 8 keV energy range, we have designed and coated aperiodic multilayer mirrors by using Ni/SiC with and without W barrier layers. The experimental reflectivity profiles as a function of the photon energy were measured on a synchrotron radiation facility in both cases. Adding W barrier layers in Ni/SiC multilayers provides a better precision on the layer thicknesses and a very good agreement between the experimental data and the targeted spectral profile.

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Developments in realistic design for aperiodic Mo/Si multilayer mirrors

Cited by 68 publications

References 9 publications

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

X-ray broadband Ni/SiC multilayers: improvement with W barrier layers

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