Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD).

Abstract

Developed a process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD). We used a special emitter (implantor) to generate Cr, Mo ions with high energy. Such key parameters of coatings as composition, structure, a thickness, hardness, adhesion in relation to a substrate obtained at various energy of chrome ions have been studied. A phenomenological (physical) model of assisted filtered cathodic-vacuum-arc deposition (AFCVAD), allows to predict the properties of the coatings formed on the basis of binary compounds as a function of the relationship Ra, characterizing parameters of ion implantation.