2012
DOI: 10.1109/tcpmt.2012.2215327
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Development Pattern Recognition Model for the Classification of Circuit Probe Wafer Maps on Semiconductors

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Cited by 26 publications
(18 citation statements)
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“…These reflections cause unwanted vertical edges on the pads in the subsequent edge detection step, and should be removed to increase solder defect detection accuracy. The reflections are detected using the circular Hough transform [8] where a cricle is represented using:…”
Section: Vertical Edge Detection Based Methodsmentioning
confidence: 99%
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“…These reflections cause unwanted vertical edges on the pads in the subsequent edge detection step, and should be removed to increase solder defect detection accuracy. The reflections are detected using the circular Hough transform [8] where a cricle is represented using:…”
Section: Vertical Edge Detection Based Methodsmentioning
confidence: 99%
“…The locus of (a, b) points in the parameter space fall on a circle of radius R centered at (x, y). The true center point will be common to all parameter circles, and is found using a Hough accumulation array [8]- [11].…”
Section: Vertical Edge Detection Based Methodsmentioning
confidence: 99%
“…Hence, it is important to separate random and systematic defects in the WBM since the systematic defect's signature can reveal the process problem. Therefore, it is important to detect and classify these defects, in order to identify the root causes of failure and to take appropriate actions for quality and yield enhancement [55], [58], [59], [61]. Although after generating the WM, the defective dies can be detected by an experienced human inspector; however, as this process can be costly and time consuming, many researchers evaluated the dies' quality using AOI techniques [62].…”
Section: B Semiconductor Wafer Defectsmentioning
confidence: 99%
“…Many papers afford quality issues using DM techniques [50][51][52][53][54][55][56][57][58][59][60][61][62][63] . Among them, semiconductor and electronics manufacturing can be considered a hot topic [51,53,58,59,61,63]. Quality problems together with new capabilities usually influence the design process of new products.…”
Section: Kdd Techniques Applied To Manufacturing Processesmentioning
confidence: 99%