Development of vacuum ultraviolet absorption spectroscopy system for wide measurement range of number density using a dual-tube inductively coupled plasma light source

Kuwahara, Akira; Matsui, Makoto; Yamagiwa, Yoshiki

doi:10.1063/1.4770118

Cited by 6 publications

(3 citation statements)

References 16 publications

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“…In this spectral region, two-photon techniques such as TALIF allow diagnostics without the use of vacuum ultra violet radiation [6] [70,71] and VUV radiation was created with a deuterium lamp [72]. For resonance absorption, a high pressure N 2 microdischarge hollow-cathode lamp [73], a dual-tube inductively coupled plasma light source [74] and via a surface wave excited discharge in Ar/O 2 at 130 nm to measure O atoms [75] were used. In the UV spectral region, the commonly used Xe or D 2 lamp sources [46,64] are being increasingly replaced by UV LEDs [64,72,76].…”

Section: Light Sources For Absorption Spectroscopymentioning

confidence: 99%

Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets

Reuter

Sousa

Stancu

et al. 2015

Plasma Sources Sci. Technol.

108

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Absorption spectroscopy (AS) represents a reliable method for the characterization of cold atmospheric pressure plasma jets. The method's simplicity stands out in comparison to competing diagnostic techniques. AS is an in situ, non-invasive technique giving absolute densities, free of calibration procedures, which other diagnostics, such as laser-induced fluorescence or optical emission spectroscopy, have to rely on. Ground state densities can be determined without the knowledge of the influence of collisional quenching. Therefore, absolute densities determined by absorption spectroscopy can be taken as calibration for other methods. In this paper, fundamentals of absorption spectroscopy are presented as an entrance to the topic. In the second part of the manuscript, a review of AS performed on cold atmospheric pressure plasma jets, as they are used e.g. in the field of plasma medicine, is presented. The focus is set on special techniques overcoming not only the drawback of spectrally overlapping absorbing species, but also the line-of-sight densities that AS usually provides or the necessity of sufficiently long absorption lengths. Where references are not available for measurements on cold atmospheric pressure plasma jets, other plasma sources including low-pressure plasmas are taken as an example to give suggestions for possible approaches. The final part is a table summarizing examples of absorption spectroscopic measurements on cold atmospheric pressure plasma jets. With this, the paper provides a 'best practice' guideline and gives a compendium of works by groups performing absorption spectroscopy on cold atmospheric pressure plasma jets.

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Section: Light Sources For Absorption Spectroscopymentioning

confidence: 99%

Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets

Reuter

Sousa

Stancu

et al. 2015

Plasma Sources Sci. Technol.

108

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“…Compared with these methods, vacuum ultraviolet absorption spectroscopy (VUVAS) technique has minimal influence on the processing plasma, and it has been widely used for the absolute radical density determination in processing plasma. [9][10][11] The etching effect of oxygen atoms with Ar=O 2 or Ar=N 2 =O 2 gas mixture in inductively-coupled plasma and N 2 =O 2 gas mixture in microwave plasma had been reported previously, 12,13) but the relation between etching and oxygen atomic density was still not clear enough. For the similar low pressure N 2 =O 2 microwave plasma in Ref.…”

mentioning

confidence: 90%

Oxygen atomic density measured with a self-absorption calibrated vacuum ultraviolet absorption spectroscopy and its effect on spore etching in N₂/O₂surface-wave plasma

Yang¹,

Chang²,

Tei³

et al. 2015

Jpn. J. Appl. Phys.

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We present a measurement of the star formation properties of a uniform sample of mid-IR-selected, optically unobscured, and obscured quasars (QSO1s and QSO2s) in the Boötessurvey region. We use a spectral energy distribution analysis for photometric data spanning optical to far-IR wavelengths to separate the active galactic nucleus (AGN) and host galaxy components. We find that when compared to a matched sample of QSO1s, the QSO2s have roughly twice the far-IR detection fractions, far-IR fluxes, and infrared star formation luminosities (L IR SF ). Correspondingly, we show that the AGN obscured fraction rises from 0.3 to 0.7 between (4-40) ×  L 10 11 . We also find evidence associating X-ray absorption with the presence of far-IR-emitting dust. Overall, these results are consistent with galaxy evolution models in which quasar obscuration is associated withdust-enshrouded starburst galaxies.

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“…Diagnostic methods such as laser-induced fluorescence (LIF) [4], actinometry [5], vacuum ultraviolet absorption spectroscopy (VUVAS) [6], and cavity-enhanced absorption [7] have been developed to measure absolute radical densities. Among these methods, the VUVAS technique is simple and has minimal influence on the processing plasma, so it has been used to determine the absolute radical densities in processing plasmas [8][9][10][11][12]. For the VUVAS measurement, it is important to analyze the emission line profile of light source before the measurement.…”

Section: Introductionmentioning

confidence: 99%

Self-absorption-calibrated vacuum ultraviolet absorption spectroscopy for absolute oxygen atomic density measurement

Yang¹,

Sasaki²,

Nagatsu³

2015

Plasma Sources Sci. Technol.

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Using a compact microwave plasma light source, a self-absorption-calibrated vacuum ultraviolet absorption spectroscopy (VUVAS) method was developed based on resonance escape factor theory and numerical analysis of the emission profile using Specair. After theoretical calibration of the self-absorption effect for two adjacent oxygen lines at 130.22 nm and 130.49 nm emitted from the light source, absolute oxygen atomic densities were measured for different N 2 /O 2 gas mixture ratios in surface-wave plasmas. The oxygen atomic densities obtained for the two light probes were fairly close, supporting good reliability of the proposed self-absorption-calibrated VUVAS method. It is expected from the present results that the proposed method will extend the range of application of the VUVAS method in industrial plasma processing.

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Development of vacuum ultraviolet absorption spectroscopy system for wide measurement range of number density using a dual-tube inductively coupled plasma light source

Cited by 6 publications

References 16 publications

Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets

Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets

Oxygen atomic density measured with a self-absorption calibrated vacuum ultraviolet absorption spectroscopy and its effect on spore etching in N₂/O₂surface-wave plasma

Self-absorption-calibrated vacuum ultraviolet absorption spectroscopy for absolute oxygen atomic density measurement

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Development of vacuum ultraviolet absorption spectroscopy system for wide measurement range of number density using a dual-tube inductively coupled plasma light source

Cited by 6 publications

References 16 publications

Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets

Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets

Oxygen atomic density measured with a self-absorption calibrated vacuum ultraviolet absorption spectroscopy and its effect on spore etching in N2/O2surface-wave plasma

Self-absorption-calibrated vacuum ultraviolet absorption spectroscopy for absolute oxygen atomic density measurement

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Product

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Oxygen atomic density measured with a self-absorption calibrated vacuum ultraviolet absorption spectroscopy and its effect on spore etching in N₂/O₂surface-wave plasma