2002
DOI: 10.1109/58.981388
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Development of the line-focus-beam ultrasonic material characterization system

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Cited by 83 publications
(75 citation statements)
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“…In actual measurements, the values of ∆z and α 0 depend on the system (mainly the LFB ultrasonic device) and ultrasonic frequency so that measured values of V LSAW and α LSAW obtained from (1) and (2) are different from the actual material values [13], [14]. We thus conduct the following system calibration according to the method proposed in the literature [13].…”
Section: Calibration Methodsmentioning
confidence: 98%
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“…In actual measurements, the values of ∆z and α 0 depend on the system (mainly the LFB ultrasonic device) and ultrasonic frequency so that measured values of V LSAW and α LSAW obtained from (1) and (2) are different from the actual material values [13], [14]. We thus conduct the following system calibration according to the method proposed in the literature [13].…”
Section: Calibration Methodsmentioning
confidence: 98%
“…The two LFB-UMC systems used in this paper are called Systems A [2] and B [3]. Each system was installed in a temperature-controlled chamber that includes a mechanical system with ultrasonic device and specimens in order to maintain a stable measurement environment.…”
Section: Lfb-umc Systemmentioning
confidence: 99%
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“…LSAW velocities were measured by the line-focus-beam ultrasonic material characterization (LFB-UMC) system [4,5], and bulk-wave velocities were measured by the plane-wave UMC (PW-UMC) system [6,7]. Densities were measured by the Archimedes method [8].…”
Section: Methodsmentioning
confidence: 99%
“…[520]. Applications include the measurement of condensate film growth on a cooled metal surface [459], measurement of lubricant film thickness between two solid bodies [115], measurement of a thin-film layer on an anisotropic substrate by a phase-sensitive acoustic microscope [437], and the development of a line-focus-beam ultrasonic material characterization system for evaluating large diameter crystals and wafers [250]. The U.S. Patent Office website [528] lists 86 patents for this technique, several of which are applicable to crystal growth measurement.…”
Section: Acoustic Reflectionmentioning
confidence: 99%