Development of the Jyväskylä microbeam facility

Norarat, Rattanaporn; Sajavaara, Timo; Laitinen, Mikko; Heikkinen, Pauli; Ranttila, K.; Ylikorkala, Kari; HäNninen, VäInö; Rossi, Mikko; Jones, P.; Marjomäki, Varpu; Gilbert, Leona; Whitlow, Harry J.

doi:10.1016/j.nimb.2011.01.055

Cited by 3 publications

(2 citation statements)

References 15 publications

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“…A typical TOF-ERDA set-up is described by Norarat et al [14]. Ions from accelerators with high terminal voltage are typically used, in particular heavy and multiply charged incident ions of Cl, Cu, Br or Au.…”

Section: Elastic Recoil Detection Analysismentioning

confidence: 99%

Particle-Based Imaging Techniques

Adams¹,

Barbante²

2015

Chemical Imaging Analysis

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Section: Elastic Recoil Detection Analysismentioning

confidence: 99%

Particle-Based Imaging Techniques

Adams¹,

Barbante²

2015

Chemical Imaging Analysis

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“…In the beginning of 2011 the accelerator was equipped with SNICS and Alphatross ion sources for production of negative ions from H − to Au − . The PIXE and lithography applications in addition to the planned microbeam imaging facility [2] would benefit significantly from increased H − beam brightness and better stability compared to the H − beams available from the Alphatross and SNICS ion sources. Therefore a project was started to develop PELLIS, the Pelletron Light Ion Source, an ion source dedicated for high-brightness H − beam production.…”

Section: H − Ion Source For Pelletron Acceleratormentioning

confidence: 99%

Recent negative ion source activity at JYFL

Kalvas¹,

Tarvainen²,

Komppula³

et al. 2013

AIP Conference Proceedings

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A filament-powered multicusp ion source for production of H − has been developed for the Jyväskylä Pelletron accelerator for use in ion beam lithography and particle induced X-ray emission applications. The source can be considered conventional with the exception of the filter field being created with an electric magnet for continuous adjustability. A permanent magnet dipoleantidipole electron dump is integrated in the puller electrode. The source provides 50 µA H − beam at 10 keV energy with 0.019 mm mrad 95 % normalized rms emittance through a 2 mm aperture. Lower emittance is achievable by changing the plasma electrode insert to a smaller aperture one if application requires. A new commercial MCC30/15 cyclotron has been installed at the Jyväskylä accelerator laboratory providing 30 MeV H + and 15 Mev D + for use in nuclear physics experiments and applications. The ion source delivered with the cyclotron is a a filament-powered multicusp source capable of about 130 h continuous operation at 1 mA H − output between filament changes. The ion source is located in the cyclotron vault and therefore a significant waiting time for the vault cooldown is required before filament change is possible. This kind of operation is not acceptable as 350 h and longer experiments are expected. Therefore a project for developing a CW 13.56 MHz RF ion source has been initiated. A planar RF antenna replacing the filament back plate of the existing TRIUMF-type ion source has been used in the first tests with 240 µA of H − and 21 mA of electrons measured at 1.5 kW of RF power. Tests with higher RF power levels were prevented by electron beam induced sparking. A new plasma chamber has been built and a new extraction is being designed for the RF ion source. The extraction code IBSimu has recently gone through a major update on how smooth electrode surfaces are implemented in the Poisson solvers. This has made it possible to implement a fast multigrid solver with low memory consumption. Also a method has been made to import 3D CAD geometries into simulations.

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