2019
DOI: 10.1088/1742-6596/1410/1/012236
|View full text |Cite
|
Sign up to set email alerts
|

Development of technology for the formation of vacuum field emission cells using focused ion beams

Abstract: The article presents the results of the development of technology for the formation of vacuum field emission structures. Experimental studies of local ion-stimulated deposition of W and C and ion-beam etching were carried out and their effects on the formation of final structures were studied. The technological process of manufacturing nanoscale field emission structures was developed, and experimental samples were fabricated. It is shown that the use of the method of focused ion beams (FIB) demonstrates its a… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2020
2020
2020
2020

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
references
References 6 publications
0
0
0
Order By: Relevance