“…In this work, several SIMS approaches were investigated in order to define a depth profiling protocol able to ensure depth and concentration accuracies for Sn concentrations in Ge of technological relevance. It was observed that the analytical conditions less affected by interface and transient effects (Cs + sputtering at 1 keV impact energy, 64 • incidence vs. normal, collecting SnCs + positive secondary ions) induced an early and specific formation of surface topography [5][6][7][8][9] resulting in a variation of sputtering yield. In this work, a sequential formation of dots and ripples on the crater bottom was observed.…”