Development of Highly Dense Material-Specific Fluorophore Labeling Method on Silicon-Based Semiconductor Materials for Three-Dimensional Multicolor Super-Resolution Fluorescence Imaging

Abstract

The recent development of super-resolution fluorescence microscopy (SRM) has drastically improved the resolution of light microscopy to the order of tens of nanometers. However, the application of SRM to semiconductor materials remains challenging because fluorophore labeling on inorganic materials with a high labeling density required for nanoimaging has been limited with conventional surface functionalization methods. Here, a novel approach for highly dense material-specific fluorophore labeling methods on silicon-based materials has been developed and demonstrated for SRM imaging of semiconductor line patterns. This approach is shown to selectively and sensitively probe different-sized silicon and silica line patterned arrays including edge structures on a wafer in three dimension, which has not been resolved by a conventional metrology system. Furthermore, we successfully demonstrate that this new method can detect nanoparticle defects with high sensitivity, suggesting its capability as an inspection tool for semiconductor defects. This new nanomaterial imaging approach is expected to drive further innovations in metrology tools and applications.

Interactive image annotation and AI-assisted segmentation of TEM images for automatic CD measurement

“…To accelerate MI and improve throughput, new technologies such as multi-beam inspection [1] and massive overlay measurement [2][3] have been developed. For accuracy enhancement, EUV imaging [4], multi-angle ellipsometry [5], fluorescence imaging [6], ptychography [7], and microsphere-assisted hyperspectral imaging [8] have been developed. In addition to above mentioned in-line MI technologies, out-fab destructive analysis is important to have deeper understanding of the root causes and complex phenomena occurring within the semiconductor manufacturing process.…”

Photoswitching Reagent for Super‐Resolution Fluorescence Microscopy

“…Recently, SMLM has opened up new applications across various scientific disciplines. Such applications include semiconductor and polymer nanostructures, enabling research into the nanoscale properties of nanomaterials [10–14] . The super‐resolution imaging capability of SMLM is based on fluorophore photoswitching, which enables precise localization of the individual fluorophore molecules and the reconstruction of super‐resolved images [15] .…”

“…Such applications include semiconductor and polymer nanostructures, enabling research into the nanoscale properties of nanomaterials. [10][11][12][13][14] The super-resolution imaging capability of SMLM is based on fluorophore photoswitching, which enables precise localization of the individual fluorophore molecules and the reconstruction of super-resolved images. [15] Therefore, understanding the photoswitching of fluorophores is important because this phenomenon is a fundamental aspect of SMLM techniques such as stochastic optical reconstruction microscopy (STORM) and photoactivated localization microscopy (PALM).…”

Single-molecule fluorescence imaging of photocatalytic nanomaterials

“…22 This non-destructive imaging feature preserves the integrity of the sample and enables longitudinal studies of photocatalytic processes over extended periods, promoting the exploration of long-term performance, degradation mechanisms, and catalyst evolution. 23,24…”