Development of electrostatic supercapacitors by atomic layer deposition on nanoporous anodic aluminum oxides for energy harvesting applications

Iglesias, Lucía; Vega, V.; Garcı́a, Javier; Hernando, B.; Prida, V.M.

doi:10.3389/fphy.2015.00012

Cited by 13 publications

(11 citation statements)

References 38 publications

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“…Meanwhile, SiO 2 deposition, carried out at 150 • C, yielded a deposition rate of 0.06 nm/cycle, as previously reported [18,29]. For the double layered samples, schematized in Figure 1e, a SiO 2 layer was first deposited on the NPAS as described above; afterwards, the samples were coated with Al 2 O 3 or AZO with a layer thickness of about 3.5 nm, which were the corresponding growth rates of the Al 2 O 3 and AZO layers at 200 • C that had been previously studied by means of mechanical profilometry and ellipsometry measurements [32]. It is worth clarifying that the AZO layer consisted of a mixture of Zn and Al oxides obtained by performing 20 deposition cycles of ZnO, followed by one cycle of Al 2 O 3 , which corresponded to most of the external surface; through this approach, a doping of around 3% of Al in the ZnO layer was obtained [33,34].…”

Section: Npas Fabrication and Surfaces Coating By Atomic Layer Deposimentioning

confidence: 92%

Influence of ALD Coating Layers on the Optical Properties of Nanoporous Alumina-Based Structures

et al. 2019

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Optical changes associated with the surface coating of different metal oxides and nanolayers by the ALD technique of a nanoporous alumina structure (NPAS) obtained by the two-step anodization method were analyzed. The NPASs were coated with: (i) a single layer (SiO2 or TiO2), and (ii) a double layer of SiO2 plus Al2O3 or aluminum doped ZnO (AZO) to estimate the effect of surface layer coverage material, geometrical parameters (pore-size/porosity), and number of layers on light transmission/reflection. Chemical surface characterization of the different NPASs was carried out by analyzing XPS spectra, which allowed us to obtain an estimation of the coating layer homogeneity. Transmittance and spectroscopic ellipsometry measurements were analyzed in order to detect changes in characteristic optical parameters such as band gap, refractive index, and extinction coefficients associated with the material and the characteristics of the single or double coating layers.

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Section: Npas Fabrication and Surfaces Coating By Atomic Layer Deposimentioning

confidence: 92%

Influence of ALD Coating Layers on the Optical Properties of Nanoporous Alumina-Based Structures

et al. 2019

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“…More researches have been published on metal-insulator-metal capacitors using ALD [198][199][200][201]. More work on the application of ALD for capacitors has been done by different researchers looking at the growth rate, limitations and various applications on different materials [202][203][204][205][206][207]. Figure 8.…”

Section: Capacitorsmentioning

confidence: 99%

New development of atomic layer deposition: processes, methods and applications

Oviroh

Akbarzadeh

Pan

et al. 2019

Science and Technology of Advanced Materials

352

200

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Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities. They include uniform deposition of conformal films with controllable thickness, even on complex three-dimensional surfaces, and can improve the efficiency of electronic devices. This technology has attracted significant interest both for fundamental understanding how the new functional materials can be synthesized by ALD and for numerous practical applications, particularly in advanced nanopatterning for microelectronics, energy storage systems, desalinations, catalysis and medical fields. This review introduces the progress made in ALD, both for computational and experimental methodologies, and provides an outlook of this emerging technology in comparison with other film deposition methods. It discusses experimental approaches and factors that affect the deposition and presents simulation methods, such as molecular dynamics and computational fluid dynamics, which help determine and predict effective ways to optimize ALD processes, hence enabling the reduction in cost, energy waste and adverse environmental impacts. Specific examples are chosen to illustrate the progress in ALD processes and applications that showed a considerable impact on other technologies.

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“…In recent years, several investigations based on nanotechnology have achieved important improvements in energy storage capacity of electrostatic capacitors [3,4]. Manufacturing of devices with high storage capacities and energy densities of up to 4 Wh/kg has been demonstrated [5,6], while maintaining the high power density characteristic of electrostatic capacitors.…”

Section: Introductionmentioning

confidence: 99%

“…This technique is also used to form supercapacitor devices over multiple substrates. There is a detailed study that applies ALD on NAAMs [4][5][6][7] in a very similar way to what was conducted in this work, developing new electrostatic supercapacitor devices, in which ALD becomes essential in the conformation of its electrodes and dielectric material. However, its range of application goes further, as ALD has been successfully used in recent years for electrochemical capacitor manufacturing over bundles of carbon nanotubes (CNT) [18,19], or TiO 2 nanoparticles [20].…”

Section: Introductionmentioning

confidence: 99%

“…The electrical behavior of this new multilayered capacitor is compared with the performance of a single layer capacitor, which is conformed by Al 2 O 3 as the dielectric layer. This last dielectric is a material whose ALD deposition has been widely characterized [4][5][6]11,14,24,25], and which also exhibits an intermediate permittivity and band gap values with respect to TiO 2 and SiO 2 . Table 1.…”

Section: Introductionmentioning

confidence: 99%

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Electrostatic Supercapacitors by Atomic Layer Deposition on Nanoporous Anodic Alumina Templates for Environmentally Sustainable Energy Storage

et al. 2018

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In this work, the entire manufacturing process of electrostatic supercapacitors using the atomic layer deposition (ALD) technique combined with the employment of nanoporous anodic alumina templates as starting substrates is reported. The structure of a usual electrostatic capacitor, which comprises a top conductor electrode/the insulating dielectric layer/and bottom conductor electrode (C/D/C), has been reduced to nanoscale size by depositing layer by layer the required materials over patterned nanoporous anodic alumina membranes (NAAMs) by employing the ALD technique. A thin layer of aluminum-doped zinc oxide, with 3 nm in thickness, is used as both the top and bottom electrodes’ material. Two dielectric materials were tested; on the one hand, a triple-layer made by a successive combination of 3 nm each layers of silicon dioxide/titanium dioxide/silicon dioxide and on the other hand, a simple layer of alumina, both with 9 nm in total thickness. The electrical properties of these capacitors are studied, such as the impedance and capacitance dependences on the AC frequency regime (up to 10 MHz) or capacitance (180 nF/cm2) on the DC regime. High breakdown voltage values of 60 V along with low leakage currents (0.4 μA/cm2) are also measured from DC charge/discharge RC circuits to determine the main features of the capacitors behavior integrated in a real circuit.

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Development of electrostatic supercapacitors by atomic layer deposition on nanoporous anodic aluminum oxides for energy harvesting applications

Cited by 13 publications

References 38 publications

Influence of ALD Coating Layers on the Optical Properties of Nanoporous Alumina-Based Structures

Influence of ALD Coating Layers on the Optical Properties of Nanoporous Alumina-Based Structures

New development of atomic layer deposition: processes, methods and applications

Electrostatic Supercapacitors by Atomic Layer Deposition on Nanoporous Anodic Alumina Templates for Environmentally Sustainable Energy Storage

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