2001
DOI: 10.1149/1.1343106
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Development of Dielectric Properties of Niobium Oxide, Tantalum Oxide, and Aluminum Oxide Based Nanolayered Materials

Abstract: Nb2O5, Ta2O5, and Al2O3 solid solutions and nanolaminates were grown using atomic layer deposition technique. Electrical properties of the materials deposited were comparatively characterized by studying the behavior of Al/niobium-aluminum (tantalum) oxide/indium-tin oxide capacitor structures. The films with high Nb content demonstrated high polarizability and leakage current density. The films with high Al content demonstrated low leakage current densities. The leakage currents in Nb-based films were re… Show more

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Cited by 109 publications
(74 citation statements)
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“…31 The value of DS for amorphous alloys would also include the contribution from increased configurational entropy, 31 suggesting that the variety of atomic configuration is a determining factor for DS and therefore D 0 as well. According to extensive studies on the atomic configuration of amorphous Al 2 O 3 , it is commonly accepted that amorphous Al 2 O 3 is composed of a majority of AlO 4 and AlO 5 basic units, and a minority of AlO 6 units. On the other hand, amorphous Ta 2 O 5 has a wider variety of basic units TaO x (x ¼ 3-7).…”
Section: B Oxygen Diffusionmentioning
confidence: 99%
See 1 more Smart Citation
“…31 The value of DS for amorphous alloys would also include the contribution from increased configurational entropy, 31 suggesting that the variety of atomic configuration is a determining factor for DS and therefore D 0 as well. According to extensive studies on the atomic configuration of amorphous Al 2 O 3 , it is commonly accepted that amorphous Al 2 O 3 is composed of a majority of AlO 4 and AlO 5 basic units, and a minority of AlO 6 units. On the other hand, amorphous Ta 2 O 5 has a wider variety of basic units TaO x (x ¼ 3-7).…”
Section: B Oxygen Diffusionmentioning
confidence: 99%
“…There is growing interest in amorphous oxides for use as functional materials in a wide range of applications in the field of electrical, optical, chemical, and environmental engineering. For example, amorphous Al 2 O 3 (a-Al 2 O 3 ), a-Ta 2 O 5 , and a-Nb 2 O 5 are considered good coating materials for electrical, [1][2][3][4] biomedical, 5 and optical devices [6][7][8] because of their excellent dielectric, corrosion resistance, and reflective properties, respectively. For practical uses, the thermal stability of the layer is an important factor.…”
Section: Introductionmentioning
confidence: 99%
“…The resistivity of the coating can be customized by adjusting the ratio of the two species. 10 However, we found during testing that the film would undergo a slow breakdown and its resistivity would degrade in a matter of weeks under the high electrical field between the electrodes (up to 25 MV∕m). An alternative coating composed of nanoclusters of a conductive oxide (MoO 3−x ) embedded in a matrix of Al 2 O 3 was employed in its place.…”
Section: Overcoming Electrostatic Chargingmentioning
confidence: 93%
“…Tantalum pentoxide (Ta 2 O 5 ) has received considerable attention recently as a new generation of dielectrics to substitute SiO 2 in microelectronic devices because of its high dielectric constant (e.g., >20 depending on deposition conditions), and chemical and thermal stability. [ 33,34 ] Figure 1 illustrates the synthetic wileyonlinelibrary.com © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim route to the organic-inorganic hybrids, which includes the preparation of the telechelic P(VDF-CTFE) with hydroxyl terminal groups and subsequent sol-gel condensation with tantalum ethoxide (Ta(OCH 2 CH 3 ) 5 ).…”
Section: Synthesis and Structure Characterizationmentioning
confidence: 99%