2007
DOI: 10.1002/ppap.200730705
|View full text |Cite
|
Sign up to set email alerts
|

Development of Diamond Machinable Films by Reactive Magnetron Sputtering

Abstract: Thin Ni‐doped titanium nitride (Ti‐Ni‐N) films were deposited on X42Cr13 steel samples by reactive magnetron sputtering. By varying the nitrogen gas flow and target composition, films with different nickel and nitrogen contents were grown with a plastic universal hardness between 7.2 and 17.2 GPa. SEM analysis revealed amorphous, fine crystalline and columnar structure depending on the chemical composition. Furthermore, a contact test was carried out to investigate the reactivity between the film surface and s… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 9 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?