“…In recent decades, even inorganic coatings can be produced through CVD technologies. Moreover, these methods can be used to purify various substances and precipitates, single-crystal, polycrystalline, and other inorganic thin-film materials ( Jin et al, 2013 ; Manawi et al, 2018 ). Based on the influential parameters and chemical interactions, CVD methods can be divided into ambient pressure ( Jang et al, 2015 ), low-pressure ( Gao et al, 2011 ; Umrao et al, 2017 ), thermal ( Zeng et al, 2018 ), ultra-high vacuum ( Multone et al, 2008 ), and organic metal CVD methods ( Maury and Senocq, 2003 ; Gong et al, 2013 ).…”