2003
DOI: 10.1016/s0920-5632(03)02109-1
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Development of CsI crystals for WIMP search

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Cited by 6 publications
(4 citation statements)
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“…In the hydrophilic surfactants category, Tween 80 was by far the most applied, followed by Kolliphor EL, with Tween 20 and Solutol HS15 also being used. All these surfactants have been proven to have the capacity to increase skin drug permeation and retention by potentially being able to increase the skin barrier lipids' fluidity and hence reduce the stratum corneum's barrier function, hence making them adequate for skin drug delivery [260][261][262][263]. In what concerns cosolvents/cosurfactants, Transcutol was the most utilized.…”
Section: Novel Nanoemulgels For Skin Application: the Future Of Topic...mentioning
confidence: 99%
“…In the hydrophilic surfactants category, Tween 80 was by far the most applied, followed by Kolliphor EL, with Tween 20 and Solutol HS15 also being used. All these surfactants have been proven to have the capacity to increase skin drug permeation and retention by potentially being able to increase the skin barrier lipids' fluidity and hence reduce the stratum corneum's barrier function, hence making them adequate for skin drug delivery [260][261][262][263]. In what concerns cosolvents/cosurfactants, Transcutol was the most utilized.…”
Section: Novel Nanoemulgels For Skin Application: the Future Of Topic...mentioning
confidence: 99%
“…7,8 Since SiC etches are in direct contact with the channel of SiC device, they have also been reported to profoundly affect the channel mobility of SiC MOSFETs. 11,12 With a scanning electron microscope, the roughness of SiC film was estimated, etched either in the ICP or in electron cyclotron resonance plasma. 10) (or CHF 3 ) plasmas, and in C 2 F 6 inductively coupled plasma.…”
Section: Introductionmentioning
confidence: 99%
“…9 The bias power effect has been studied in detail in various plasma conditions. 11 Another important parameter frequently controlled in plasma etching is the pressure. Plasma etching is typically conducted at relatively low pressures ,10 mTorr.…”
Section: Introductionmentioning
confidence: 99%