Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica

shi, Chunjing; Fan, Yuanhang; Zhang, Zhenyu; Deng, Xingqiao; Yu, Jiaxin; Zhou, Hongxiu; Meng, Fanning; Feng, Junyuan

doi:10.1016/j.apsusc.2024.159293

Applied Surface Science

2024

DOI: 10.1016/j.apsusc.2024.159293

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Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica

Chunjing shi,

Yuanhang Fan,

Zhenyu Zhang

et al.

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Cited by 14 publications

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Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica

Cited by 14 publications

References 42 publications

Photocatalytic activity of zinc oxide/hemimorphite/silica aerogel materials: performance and mechanism

Photocatalytic activity of zinc oxide/hemimorphite/silica aerogel materials: performance and mechanism

Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)

Close atomic surface on aluminum alloy using green chemical mechanical polishing with synergistic effect between yttria and silica abrasives

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