Development of catalytic chemical vapor deposition apparatus for large size substrates

Recent situation of industrial implementation of Cat-CVD technology in Japan

“…In this machine, the catalyzer is set vertically and substrates are also set in parallel to it at both sides of catalyzer. It is confirmed that the quality of films deposited on both sides of substrates is equivalent [21].…”

Amorphous and Microcrystalline Silicon Solar Cells

“…The issues regarding scaling-up of the HWCVD technique concern the uniform deposition over the large area, the filament lifetime and filament ageing. The Japanese company Anelva [136] introduced a HWCVD deposition system for large-area deposition, and Ulvac Inc. developed a large-area deposition apparatus with an effective deposition area of 150 × 85 cm 2 [137].…”

ULVAC research and development of Cat-CVD applications

“…We have previously reported a large size, vertical-type, double-sided Cat-CVD apparatus designed for solar cell applications [6] (Fig. 4).…”