Development of boron liquid–metal–ion source

Ishitani, Tohru; Umemura, K.; Hosoki, Shigeyuki; Takayama, S.; Tamura, Hiroshi

doi:10.1116/1.572410

Cited by 24 publications

(7 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…5) Various ion sources 6) have been used for scanning ion beam instruments. For example, a penning ion source, 7) duoplasmatron ion source, 8,9) multicusp ion source, 10) inductively coupled plasma ion source (ICP), 11,12) and liquid metal ion source (LMIS) 13,14) have been used.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of krypton ion emission from a gas field ionization source with a single atom tip

Shichi¹,

Matsubara²,

Hashizume³

2017

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

A scanning ion beam instrument equipped with a gas field ionization source (GFIS) has been commercialized, but only helium and neon are currently available as GFISs. The characteristics of krypton ion emission from a single atom tip (SAT) have not been reported yet. In this study, the characteristics of krypton ion emission were investigated by field ion microscopy. At 65 K, the krypton ion emission current reached approximately 40 pA, which is 1 order of magnitude higher than that at 130 K. As the krypton gas pressure was increased, the krypton ion current increased. At a pressure of 0.3 Pa, the emission current was anticipated to reach 200 pA, which may be high enough for nanofabrication. The variation of the krypton ion current was as low as 5% in one hour. We concluded that a krypton ion beam instrument equipped with a GFIS will be a powerful tool for nanofabrication.

show abstract

Section: Introductionmentioning

confidence: 99%

Characteristics of krypton ion emission from a gas field ionization source with a single atom tip

Shichi¹,

Matsubara²,

Hashizume³

2017

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

show abstract

“…For 40 hours of operation of the source with an emission current of 40 μA, its characteristics have not changed. To obtain boron ions, we used the Ni45B45Si10 alloy with a melting point of 900 ° C, proposed in [ 105 ]. The emitter needles were made of glassy carbon and lanthanum hexaboride.…”

Section: Obtaining Ions Of Doping Elementsmentioning

confidence: 99%

“…The general scheme of the installation for microprocessing with a focused ion beam is shown in Fig. 19 [53,105]. A photograph of an ion-optical column for microprocessing with a focused ion beam is shown in Fig.…”

Section: Formation and Application Of Submicron Ion Beamsmentioning

confidence: 99%

Electrohydrodynamic ion emitters

Dudnikov

Shabalin

1990

J Appl Mech Tech Phys

View full text Add to dashboard Cite

Physical processes that determine the generation of ion beams with a high emission current density in electrohydrodynamic emitters are considered. Electrohydrodynamic effects, which are manifested in the features of ion emission, and the kinetics of ion interaction in high-density beams are discussed. The factors that determine the size of the emission zone, stability of emission at high and low currents, cluster generation, increase in energy dispersion, and decrease in beam brightness are analyzed. The problems of the practical maintenance of the stable functioning of the EHD emitters are considered. The practical applications of EHD emitters are considered.

show abstract

“…Gallium liquid metal ion source (LMIS)-based (Krohn & Ringo, 1975; Ishitani et al, 1984; Orloff, 2008) focused ion beam (FIB) instruments (Kawanami et al, 1990; Ishitani & Kawanami, 1995; Orloff et al, 2003; Giannuzzi & Stevie, 2005) have been widely used for fabricating nano-structures by using the milling and deposition method. An LMIS is an ion source that requires a needle and melted metal on the tip of the needle.…”

Section: Introductionmentioning

confidence: 99%

Characteristics Comparison of Neon, Argon, and Krypton Ion Emissions from Gas Field Ionization Sources with a Single-Atom Tip

2019

View full text Add to dashboard Cite

A scanning ion beam instrument equipped with a gas field ionization source (GFIS) has been commercialized, but only helium and neon are currently available as GFISs. In this study, the characteristics of neon, argon, and krypton ion emissions from a single-atom tip are compared, specifically for faster fabrication by milling of a silicon sample. Although the boiling point of argon is about 87 K, our experiments on characterizing argon ion emission can be carried out at temperatures of about 50 K at an argon gas pressure lower than 0.1 Pa. Argon exhibits ion current characteristics, as a function of tip voltage, between those of neon and krypton. The value obtained by multiplying the ion emission current by the sputtering yield is suitable for a figure of merit (FOM) for faster fabrication. The FOM for argon is the highest among the three ion species. This value must be extensively evaluated from the viewpoint of practical nano-fabrication application. The instabilities of neon, argon, and krypton ion currents (3σ) become as low as 8% in 1 h, which is sufficient for fabrication applications. We conclude that an argon or krypton GFIS ion beam instrument will be a useful tool for nano-fabrication.

show abstract

Development of boron liquid–metal–ion source

Cited by 24 publications

References 0 publications

Characteristics of krypton ion emission from a gas field ionization source with a single atom tip

Characteristics of krypton ion emission from a gas field ionization source with a single atom tip

Electrohydrodynamic ion emitters

Characteristics Comparison of Neon, Argon, and Krypton Ion Emissions from Gas Field Ionization Sources with a Single-Atom Tip

Contact Info

Product

Resources

About