Development of an XUV-IR free-electron laser user facility for scientific research and industrial applications

Newnam, Brian E.; Warren, R.W.; Conradson, Steven D.; Goldstein, John C.; McVey, B.D.; Schmitt, Mark J.; Elliott, C.J.; Burns, Michael J.; Carlsten, Bruce E.; Chan, Kwok-Chi D.; Johnson, W. Joel D.; Wang, Tai-San; Sheffield, R.L.; Meier, K.L.; Olsher, R. H.; Scott, Marion L.; Griggs, J.

doi:10.1117/12.50602

Cited by 2 publications

(2 citation statements)

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“…To maintain high reflectivity, contamination must be minimized since capping layers typically used above 125 nm such as MgF 2become highly absorbing at shorter wavelengths. In situ cleaning techniques [6,7], and occasional recoating of optics will almost certainly be required [8]. These problems, familiar to designers of XUV optics [8,9], will be shared by essentially all of the optical elements utilized in the beamlines for the UV-FEL.…”

Section: Optics Design"mentioning

confidence: 99%

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Concepts for UV-FEL optics

Johnson¹

1993

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Brookhaven National Laboratory has developed a design for an ultra-violet free " electron laser facility utilizing a seeded amplifier approach. Since the accelerator is a single pass device, resonator and outcoupler mirrors which are a difficult aspect of oscillator FEL designs are not required. The result is a source of high peak power VUV radiation with the mode structure, bandwidth and frequency stability of the input seed laser. The accelerator provides pulses of radiation at up to 10 kHz, so to maximize the utilization of the source, novel optical systems to share the radiation had to be developed. These include specialized alignment, beam transport, order sorting, and multiplexing optics. In addition, FEL on FEL pump-probe experiments are made possible by a variable optical delay of up to 10 ns operating in the wavelength range of 200 to 75 nm. Some aspects of the FEL design are also described to clarify the constraints and choices for the optical system.

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Section: Optics Design"mentioning

confidence: 99%

“…The system must also provide the highest possible transmission. This can be achieved by providing a choice of either multifacet total external reflection geometry [8,11,12] for short wavelength operation, or a 45 degree reflection geometry to minimize the number of reflections for longer wavelengths.…”

Section: Optics Design"mentioning

confidence: 99%