2012
DOI: 10.4028/www.scientific.net/msf.717-720.841
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Development of an Extreme High Temperature n-Type Ohmic Contact to Silicon Carbide

Abstract: Abstract. We report on the initial demonstration of a tungsten-nickel (75:25 at. %) ohmic contact to silicon carbide (SiC) that performed for up to fifteen hours of heat treatment in argon at 1000 °C. The transfer length method (TLM) test structure was used to evaluate the contacts. Samples showed consistent ohmic behavior with specific contact resistance values averaging 5 x 10 -4 Ω-cm 2 . The development of this contact metallization should allow silicon carbide devices to operate more reliably at the presen… Show more

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Cited by 6 publications
(5 citation statements)
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“…A high thermal stability was observed for W-Ni ohmic contacts to n-type 4H-SiC characterized by specific contact resistivity of 7.69 × 10 −4 and 5.81 × 10 −4 cm 2 for doping level equal 1.4 and 2 × 10 19 cm −3 , respectively [22]. Similar value of specific contact resistivity equal 5 × 10 −4 cm 2 was obtained for W-Ni ohmic contact to n-type epitaxial layer with doping concentration in the range 5-7 × 10 18 cm −3 deposited on p-type 4H-SiC substrate [23].…”
Section: Introductionmentioning
confidence: 54%
“…A high thermal stability was observed for W-Ni ohmic contacts to n-type 4H-SiC characterized by specific contact resistivity of 7.69 × 10 −4 and 5.81 × 10 −4 cm 2 for doping level equal 1.4 and 2 × 10 19 cm −3 , respectively [22]. Similar value of specific contact resistivity equal 5 × 10 −4 cm 2 was obtained for W-Ni ohmic contact to n-type epitaxial layer with doping concentration in the range 5-7 × 10 18 cm −3 deposited on p-type 4H-SiC substrate [23].…”
Section: Introductionmentioning
confidence: 54%
“…After annealing at 1100 °C and above, W-rich structures corresponding to WC can be seen on Ni-rich fields corresponding to W x Ni y C with dissolved Si-all above Ni-Si-C regions that might be amorphous alloys or a poorly crystallized nickel silicide plus graphite. Previous work on W:Ni contacts [18,30] is now complemented with ρ c measurements for Ohmic contacts to p-4H-SiC along with further materials characterization to reveal the phase transformations and contact morphology. Ohmic contacts to p-SiC form with the W x Ni y C next to the SiC interface, but ρ c dropped slightly in some samples as Ni-Si-C regions came in contact with the SiC.…”
Section: Discussionmentioning
confidence: 99%
“…While XRD was primarily carried out on blanket thin films on p-SiC, a few samples on n-SiC support the formation of the W x Ni y C phase at 1100 °C and 1150 °C, as well as WC at 1150 °C. The presence of carbides would suggest the presence of a phase bearing silicon to complete the mass balance [18,30]. The XRD plots in figures 2-4 do not show any intense unidentified peaks, suggesting that a silicide phase may be amorphous or poorly crystallized.…”
Section: X-ray Diffractionmentioning
confidence: 97%
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“…Other electronics technologies such as silicon on insulator (SOI) circuits have been known to operate in temperatures up to 300 o C 7 . Wide band gap electronics such as silicon carbide (SiC) have been demonstrated to operate in temperatures of 500 o C or more 8,9,10,11,12 . In all cases, there is an inverse relationship between temperature and electronics reliability.…”
mentioning
confidence: 99%