2020
DOI: 10.1016/j.apsusc.2019.144670
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Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy

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Cited by 154 publications
(32 citation statements)
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“…In recent years, sustainable development has become a typically discussed theme worldwide and has increasingly attracted people's attention toward protecting the environment and energy saving, resulting in numerous advanced techniques being exploited. For example, novel environmentally friendly slurries have been developed and used widely in the semiconductor, microelectronics, and optoelectronics industries, consequently reducing pollution induced by traditional manufacturing and industries significantly [1][2][3][4]. Recently, nontoxic and eco-friendly carbon-based materials including fullerene, carbon nanotubes, graphene, onion-like carbon, nano-graphite, and nanodiamond have become research hotspots in material and chemical sciences.…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, sustainable development has become a typically discussed theme worldwide and has increasingly attracted people's attention toward protecting the environment and energy saving, resulting in numerous advanced techniques being exploited. For example, novel environmentally friendly slurries have been developed and used widely in the semiconductor, microelectronics, and optoelectronics industries, consequently reducing pollution induced by traditional manufacturing and industries significantly [1][2][3][4]. Recently, nontoxic and eco-friendly carbon-based materials including fullerene, carbon nanotubes, graphene, onion-like carbon, nano-graphite, and nanodiamond have become research hotspots in material and chemical sciences.…”
Section: Introductionmentioning
confidence: 99%
“…However, the polishing effect of optimizing experimental parameters in the CMP process is limited [10][11][12][13]. Therefore, the development of a novel polishing slurry is desirable for improving the accuracy and efficiency of CMP [14][15][16][17][18][19]. As one of these components, abrasives are critical for removing the corrosion layer by mechanical grinding in a typical CMP process.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, a novel polishing tool called an environment-friendly slurry has been recently developed to achieve high-performance surfaces while considering both economical and environmental aspects. 3947…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, a novel polishing tool called an environment-friendly slurry has been recently developed to achieve highperformance surfaces while considering both economical and environmental aspects. [39][40][41][42][43][44][45][46][47] Based on the literature review, it can be concluded that the automatic nano-finishing of the femoral head of hip joint implants to achieve a uniform surface roughness with the least standard deviation has remained a concern in both industrial and research communities. In the present work, a novel technique is designed and fabricated based on the inverse replica fixture of the femoral head in the AFF process to achieve an approximately uniform surface roughness.…”
Section: Introductionmentioning
confidence: 99%