Development of a 10 kHz high harmonic source up to 140 eV photon energy for ultrafast time-, angle-, and phase-resolved photoelectron emission spectroscopy on solid targets

Abstract

We present a newly developed high harmonic beamline for time-, angle-, and carrier-envelope phase-resolved extreme ultraviolet photoemission spectroscopy on solid targets for the investigation of ultrafast band structure dynamics in the low-fs to sub-fs time regime. The source operates at a repetition rate of 10 kHz and is driven by 5 fs few-cycle near-infrared laser pulses generating high harmonic radiation with photon energies up to 120 eV at a feasible flux. The experimental end station consists of a complementary combination of photoelectron detectors which are able to spectroscopically address electron dynamics both in real and in k-space. The versatility of the source is completed by a phase-meter which allows for tracking the carrier-envelope phase for each pulse and which is synchronized to the photoelectron detectors, thus enabling phase sensitive measurements on the one hand and the selection of single attosecond pulses for ultimate time resolution in pump-probe experiments on the other hand. We demonstrate the applicability of the source by an angle- and carrier-envelope phase-resolved photoemission measurement on a tungsten (110) surface with 95 eV extreme ultraviolet radiation.

High repetition rate ultrafast laser technology for drivinghigh-order harmonic generation

“…使钛宝石激 光放大系统输出的飞秒激光脉冲亮度有了极大的提升, 具有极高的峰值功率密度 [65] . 目前, 脉冲宽度小于 30 fs、单脉冲能量大于1 mJ、重复频率1~10 kHz量级的 钛宝石放大器仍是产生高次谐波及单个阿秒脉冲的主 力光源, 结合OPCPA技术在获得高光子能量及更短阿秒 脉冲方向优势明显 [66] . 针对高重复频率XUV光源的应 用, 科研人员使用钛宝石激光系统也进行了诸多研究.…”

Spin-ARPES EUV Beamline for Ultrafast Materials Research and Development

“…This new type of facility, incorporating HHG EUV pulses with~20 fs duration (~10 fs optional) and photon energies extending to~100 eV, led to the discovery of several ultra-fast processes in novel materials, such as 2D materials like Graphene, TaS 2 , and topological insulators [28][29][30]. Several laboratories around the world have developed such EUV beamlines for time-domain research in both materials science and atomic-molecular physics [31][32][33][34][35][36][37][38][39].…”

Attosecond laser station

“…L'Huillier group is developing an OPCPA laser with a high repetition rate (200 kHz-2 MHz) for generating XUV pulse trains, [100] and Kleineberg group developed a new attosecond source with a high repetition rate of 10 kHz. [101] Considering the advancements of XUV beamlines based on HHG and the many aforementioned applications, the main objective of the attosecond laser station (ALS) at the Synergetic Extreme Condition User Facility (SECUF) in Huairou, Beijing is to develop XUV beamlines for investigating the electron dynamics in atoms, molecules, and condensed matter on timescales ranging from tens of femtoseconds to hundreds of attoseconds. The ALS has four XUV beamlines for different end-stations that aim to study the ultrafast dynamics in atoms and molecules, condensed matter, surfaces, and nano-plasmonic structures, which are similar to Extreme Light Infrastructure (ELI) Attosecond Light Pulse Source (ELI-ALPS).…”