1996
DOI: 10.1116/1.579899
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Development of 111 texture in Al films grown on SiO2/Si(001) by ultrahigh-vacuum primary-ion deposition

Abstract: A high degree of 111 preferred orientation with minimal mosaic spread has been shown by many researchers to be essential for electromigration resistance in Al-based interconnects. We have found that 111 texture can be greatly enhanced through the use of low-energy self-ion irradiation during deposition. In these experiments, 300-nm-thick Al layers were grown on SiO2 at 65 °C from highly ionized beams provided by an ultrahigh-vacuum primary-ion deposition (PID) source. Al+ ion energies EAl+ and ion/neutral rati… Show more

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Cited by 29 publications
(2 citation statements)
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“…64 Recrystallization during the coalescence of small clusters is also known to lead to the formation of highly textured grains more easily. 65 Moreover, by increasing the synchronized bias voltage to U s = 100 and 200 V, the ⟨110⟩ texture becomes stronger and columnar grains become larger, resulting in lattice relaxation with significant decrease of compressive stress as seen in Figs. 6 and 7.…”
Section: Journal Of Applied Physicsmentioning
confidence: 96%
“…64 Recrystallization during the coalescence of small clusters is also known to lead to the formation of highly textured grains more easily. 65 Moreover, by increasing the synchronized bias voltage to U s = 100 and 200 V, the ⟨110⟩ texture becomes stronger and columnar grains become larger, resulting in lattice relaxation with significant decrease of compressive stress as seen in Figs. 6 and 7.…”
Section: Journal Of Applied Physicsmentioning
confidence: 96%
“…) was determined by sodium acetate (NaOAC) method [29]. Organic matter content was determined according to Bhattacharyya et al [30].…”
Section: Soil Measurementsmentioning
confidence: 99%